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Priority to JP3314479ApriorityCriticalpatent/JPS55126249A/ja
Publication of JPS55126249ApublicationCriticalpatent/JPS55126249A/ja
Publication of JPS5725830B2publicationCriticalpatent/JPS5725830B2/ja
Photosensitive Polymer And Photoresist Processing
(AREA)
JP3314479A1979-03-201979-03-20Adehisive* antiihalation composition for producing photosensitive polymer print plate with metal back
GrantedJPS55126249A
(en)