JPS572527A - Reduced-pressure vapor phase growing apparatus - Google Patents
Reduced-pressure vapor phase growing apparatusInfo
- Publication number
- JPS572527A JPS572527A JP7549480A JP7549480A JPS572527A JP S572527 A JPS572527 A JP S572527A JP 7549480 A JP7549480 A JP 7549480A JP 7549480 A JP7549480 A JP 7549480A JP S572527 A JPS572527 A JP S572527A
- Authority
- JP
- Japan
- Prior art keywords
- heater
- reduced
- vapor phase
- pressure vapor
- growing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55075494A JPS608622B2 (ja) | 1980-06-06 | 1980-06-06 | 減圧気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55075494A JPS608622B2 (ja) | 1980-06-06 | 1980-06-06 | 減圧気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS572527A true JPS572527A (en) | 1982-01-07 |
JPS608622B2 JPS608622B2 (ja) | 1985-03-04 |
Family
ID=13577876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55075494A Expired JPS608622B2 (ja) | 1980-06-06 | 1980-06-06 | 減圧気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS608622B2 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0653141A (ja) * | 1992-07-30 | 1994-02-25 | Toshiba Corp | 熱処理成膜装置 |
EP0709488A1 (en) | 1994-10-25 | 1996-05-01 | Shin-Etsu Handotai Company Limited | Method and apparatus for thin film growth |
-
1980
- 1980-06-06 JP JP55075494A patent/JPS608622B2/ja not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0653141A (ja) * | 1992-07-30 | 1994-02-25 | Toshiba Corp | 熱処理成膜装置 |
EP0709488A1 (en) | 1994-10-25 | 1996-05-01 | Shin-Etsu Handotai Company Limited | Method and apparatus for thin film growth |
Also Published As
Publication number | Publication date |
---|---|
JPS608622B2 (ja) | 1985-03-04 |
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