JPS5721829B2 - - Google Patents
Info
- Publication number
- JPS5721829B2 JPS5721829B2 JP12921875A JP12921875A JPS5721829B2 JP S5721829 B2 JPS5721829 B2 JP S5721829B2 JP 12921875 A JP12921875 A JP 12921875A JP 12921875 A JP12921875 A JP 12921875A JP S5721829 B2 JPS5721829 B2 JP S5721829B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50129218A JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP50129218A JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5254897A JPS5254897A (en) | 1977-05-04 |
| JPS5721829B2 true JPS5721829B2 (en) | 1982-05-10 |
Family
ID=15004049
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50129218A Granted JPS5254897A (en) | 1975-10-29 | 1975-10-29 | Plasma ion source for solid materials |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5254897A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60100340A (en) * | 1984-10-15 | 1985-06-04 | Hitachi Ltd | Coaxial microwave ion source |
| JPH01103156U (en) * | 1987-12-26 | 1989-07-12 | ||
| JPH03112100A (en) * | 1989-09-27 | 1991-05-13 | Ebara Corp | High-speed atomic beam radiating device |
| JP2744188B2 (en) * | 1993-05-14 | 1998-04-28 | 株式会社日立製作所 | Microwave ion source and ion implantation device |
| US6225569B1 (en) | 1996-11-15 | 2001-05-01 | Ngk Spark Plug Co., Ltd. | Wiring substrate and method of manufacturing the same |
| JP4289837B2 (en) | 2002-07-15 | 2009-07-01 | アプライド マテリアルズ インコーポレイテッド | Ion implantation method and method for manufacturing SOI wafer |
| JP4328067B2 (en) | 2002-07-31 | 2009-09-09 | アプライド マテリアルズ インコーポレイテッド | Ion implantation method, SOI wafer manufacturing method, and ion implantation apparatus |
-
1975
- 1975-10-29 JP JP50129218A patent/JPS5254897A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5254897A (en) | 1977-05-04 |