JPS57210556A - Power supply for ion pump - Google Patents
Power supply for ion pumpInfo
- Publication number
- JPS57210556A JPS57210556A JP9519881A JP9519881A JPS57210556A JP S57210556 A JPS57210556 A JP S57210556A JP 9519881 A JP9519881 A JP 9519881A JP 9519881 A JP9519881 A JP 9519881A JP S57210556 A JPS57210556 A JP S57210556A
- Authority
- JP
- Japan
- Prior art keywords
- ion pump
- invertor
- electric discharge
- switching
- discharge current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
- H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
Landscapes
- Electron Tubes For Measurement (AREA)
Abstract
PURPOSE:To make it possible to supply an ion pump with a proper voltage commensurate to the electric discharge current value and make use of a small sized, lightweight unit as a transformer, by installing a control circuit capable of controlling the drive time range of a switching element, while providing for an ion pump such voltage that may correspond to electric discharge current values of the ion pump. CONSTITUTION:Corresponding to the detecting value of a detection circuit 40, a control circuit 50 which controls a drive time range of the said switching transistor inside an invertor 30 is installed and it is so designed as to provide for an ion pump 10 such voltage as commensurate to its electric discharge current value, permitting it to do high frequency switching by means of the invertor 30 in addition. When switching about 2kHz by the invertor 30, frequency works out at about 400 times or about 330 times over a sine wave of 50 or 60Hz. If working magnetic flux density level is made to be equivalent to the conventional low frequency transformer T1, a sectional area is able to become 1/400 or 1/330 so that transformer T2 may be considerably miniaturized.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9519881A JPS5854465B2 (en) | 1981-06-22 | 1981-06-22 | Power supply for ion pump |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9519881A JPS5854465B2 (en) | 1981-06-22 | 1981-06-22 | Power supply for ion pump |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57210556A true JPS57210556A (en) | 1982-12-24 |
JPS5854465B2 JPS5854465B2 (en) | 1983-12-05 |
Family
ID=14131048
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9519881A Expired JPS5854465B2 (en) | 1981-06-22 | 1981-06-22 | Power supply for ion pump |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5854465B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6053157U (en) * | 1983-09-20 | 1985-04-15 | 日本電子株式会社 | ion pump power supply |
JPS6485577A (en) * | 1987-05-29 | 1989-03-30 | Anelva Corp | Power supply for sputter ion pump |
EP0337530A2 (en) * | 1988-04-14 | 1989-10-18 | VARIAN S.p.A. | Improved electronic feeder for an ion pump |
KR100455369B1 (en) * | 1997-06-30 | 2005-05-24 | 삼성전자주식회사 | Power supply device and signal transmission method of ion implantation facility |
JP2015095378A (en) * | 2013-11-13 | 2015-05-18 | 株式会社日立ハイテクノロジーズ | High-voltage generation circuit, and ion pump employing the same |
-
1981
- 1981-06-22 JP JP9519881A patent/JPS5854465B2/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6053157U (en) * | 1983-09-20 | 1985-04-15 | 日本電子株式会社 | ion pump power supply |
JPS6485577A (en) * | 1987-05-29 | 1989-03-30 | Anelva Corp | Power supply for sputter ion pump |
EP0337530A2 (en) * | 1988-04-14 | 1989-10-18 | VARIAN S.p.A. | Improved electronic feeder for an ion pump |
JPH01307153A (en) * | 1988-04-14 | 1989-12-12 | Varian Spa | Improved electron supply line for ion pump |
JPH0586024B2 (en) * | 1988-04-14 | 1993-12-09 | Varian Spa | |
KR100455369B1 (en) * | 1997-06-30 | 2005-05-24 | 삼성전자주식회사 | Power supply device and signal transmission method of ion implantation facility |
JP2015095378A (en) * | 2013-11-13 | 2015-05-18 | 株式会社日立ハイテクノロジーズ | High-voltage generation circuit, and ion pump employing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS5854465B2 (en) | 1983-12-05 |
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