JPS57204130A - Coating method for film - Google Patents

Coating method for film

Info

Publication number
JPS57204130A
JPS57204130A JP8873781A JP8873781A JPS57204130A JP S57204130 A JPS57204130 A JP S57204130A JP 8873781 A JP8873781 A JP 8873781A JP 8873781 A JP8873781 A JP 8873781A JP S57204130 A JPS57204130 A JP S57204130A
Authority
JP
Japan
Prior art keywords
plate
base
rotated
synchronously
bases
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8873781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6355778B2 (enrdf_load_stackoverflow
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8873781A priority Critical patent/JPS57204130A/ja
Publication of JPS57204130A publication Critical patent/JPS57204130A/ja
Publication of JPS6355778B2 publication Critical patent/JPS6355778B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP8873781A 1981-06-09 1981-06-09 Coating method for film Granted JPS57204130A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8873781A JPS57204130A (en) 1981-06-09 1981-06-09 Coating method for film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8873781A JPS57204130A (en) 1981-06-09 1981-06-09 Coating method for film

Publications (2)

Publication Number Publication Date
JPS57204130A true JPS57204130A (en) 1982-12-14
JPS6355778B2 JPS6355778B2 (enrdf_load_stackoverflow) 1988-11-04

Family

ID=13951227

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8873781A Granted JPS57204130A (en) 1981-06-09 1981-06-09 Coating method for film

Country Status (1)

Country Link
JP (1) JPS57204130A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5032492A (en) * 1989-08-21 1991-07-16 At&T Bell Laboratories Photolithographic masking process and apparatus
US5205867A (en) * 1989-08-21 1993-04-27 At&T Bell Laboratories Spin coating apparatus having a horizontally linearly movable wafer holder

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223140A (en) * 1975-08-14 1977-02-21 Toshiba Corp Method for the simultaneous coating of both sides of plates
JPS5656629A (en) * 1979-10-15 1981-05-18 Hitachi Ltd Method and device for application of resist
JPS56155445U (enrdf_load_stackoverflow) * 1980-04-21 1981-11-20
JPS5732626A (en) * 1980-07-24 1982-02-22 Fsi Corp Device for coating photoresist on silicon wafer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5223140A (en) * 1975-08-14 1977-02-21 Toshiba Corp Method for the simultaneous coating of both sides of plates
JPS5656629A (en) * 1979-10-15 1981-05-18 Hitachi Ltd Method and device for application of resist
JPS56155445U (enrdf_load_stackoverflow) * 1980-04-21 1981-11-20
JPS5732626A (en) * 1980-07-24 1982-02-22 Fsi Corp Device for coating photoresist on silicon wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5032492A (en) * 1989-08-21 1991-07-16 At&T Bell Laboratories Photolithographic masking process and apparatus
US5205867A (en) * 1989-08-21 1993-04-27 At&T Bell Laboratories Spin coating apparatus having a horizontally linearly movable wafer holder

Also Published As

Publication number Publication date
JPS6355778B2 (enrdf_load_stackoverflow) 1988-11-04

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