JPS57198261A - Vapor depositing device - Google Patents

Vapor depositing device

Info

Publication number
JPS57198261A
JPS57198261A JP8127781A JP8127781A JPS57198261A JP S57198261 A JPS57198261 A JP S57198261A JP 8127781 A JP8127781 A JP 8127781A JP 8127781 A JP8127781 A JP 8127781A JP S57198261 A JPS57198261 A JP S57198261A
Authority
JP
Japan
Prior art keywords
source
tracks
vapor
wheels
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8127781A
Other languages
Japanese (ja)
Inventor
Tsunemasa Mita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP8127781A priority Critical patent/JPS57198261A/en
Publication of JPS57198261A publication Critical patent/JPS57198261A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To facilitate transmission and reception of signals or controlling of vapor deposition conditions while keeping >=1 piece of the works rotating or stopped by moving a vapor source on tracks for introduction of electric current into a vapor deposition tank. CONSTITUTION:A vapor source 5 is held on wheels 2 by means of vapor source retainers 4, and this is connected through brushes 3 to the conductive wheels 2 electrically. The wheels 2 are further connected electrically to conductive tracks 1. The wheels are connected between each other by means of an insulating shaft 7. The tracks 1 are connected to an external electric power source and the electric current necessary for evaporating vapor depositing materials flows through the tracks and heats the source 5 introduced into a vapor deposition tank. The source 5 is mechanically moved by a rotating power transmission part 6 and moves on the tracks 1.
JP8127781A 1981-05-29 1981-05-29 Vapor depositing device Pending JPS57198261A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8127781A JPS57198261A (en) 1981-05-29 1981-05-29 Vapor depositing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8127781A JPS57198261A (en) 1981-05-29 1981-05-29 Vapor depositing device

Publications (1)

Publication Number Publication Date
JPS57198261A true JPS57198261A (en) 1982-12-04

Family

ID=13741868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8127781A Pending JPS57198261A (en) 1981-05-29 1981-05-29 Vapor depositing device

Country Status (1)

Country Link
JP (1) JPS57198261A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015043420A (en) * 2013-08-13 2015-03-05 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ Plasma processing devices having multi-port valve assemblies

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015043420A (en) * 2013-08-13 2015-03-05 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ Plasma processing devices having multi-port valve assemblies

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