JPS57196461A - Electron-ray source for pattern formation - Google Patents

Electron-ray source for pattern formation

Info

Publication number
JPS57196461A
JPS57196461A JP8076181A JP8076181A JPS57196461A JP S57196461 A JPS57196461 A JP S57196461A JP 8076181 A JP8076181 A JP 8076181A JP 8076181 A JP8076181 A JP 8076181A JP S57196461 A JPS57196461 A JP S57196461A
Authority
JP
Japan
Prior art keywords
ray source
light
cathodes
electron
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8076181A
Other languages
Japanese (ja)
Other versions
JPS6367742B2 (en
Inventor
Tomoaki Sakai
Akihira Fujinami
Takehisa Yashiro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP8076181A priority Critical patent/JPS57196461A/en
Publication of JPS57196461A publication Critical patent/JPS57196461A/en
Publication of JPS6367742B2 publication Critical patent/JPS6367742B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To enable a field-discharging-type electron-ray source to be applied to an exposure device or the like by making the voltage application to an anode or a cathode to be switched independently by controlling a photoconductive layer by irradiating light on desired parts of the said photoconductive layer. CONSTITUTION:A photoconductive layer 6 is prepared from antimony trisulfide, lead sulfide, cadmium sulfide or the like. As a conductive electrode 7 transmitting light, a thin film or the like of tin dioxide, titanium dioxide, gold or the like is used. In operating such an electron-ray source, light focused with an optical lens is projected from the side of the electrode 7 transmitting light toward the layer 6 adjacent to cathodes 3, and the resistance of the irradiated part of the layer 6 is reduced so as to make an emission current to be taken out of the extreme ends of the cathodes 3 by applying voltage across the cathodes 3 and an anode electrode 1 by making both the cathodes 3 and the electrode 7 transmitting light to conduct. Consequently, each electron-ray source of a high-density field-discharging-type electron-ray source matrix can be operated independently by the flickering of light. Besides, the emission current can be controlled according to the intensity of irradiated light.
JP8076181A 1981-05-29 1981-05-29 Electron-ray source for pattern formation Granted JPS57196461A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8076181A JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8076181A JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Publications (2)

Publication Number Publication Date
JPS57196461A true JPS57196461A (en) 1982-12-02
JPS6367742B2 JPS6367742B2 (en) 1988-12-27

Family

ID=13727394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8076181A Granted JPS57196461A (en) 1981-05-29 1981-05-29 Electron-ray source for pattern formation

Country Status (1)

Country Link
JP (1) JPS57196461A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269530A (en) * 1987-04-28 1988-11-07 Canon Inc Charged particle beam device
JPH07153655A (en) * 1993-11-29 1995-06-16 Nec Corp Electron-beam aligner
JPH07192682A (en) * 1993-12-27 1995-07-28 Agency Of Ind Science & Technol Device and method for irradiation by multielectron beam
JP2011181416A (en) * 2010-03-02 2011-09-15 Tohoku Univ Light switching electron source and electron beam drawing device using the same

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63269530A (en) * 1987-04-28 1988-11-07 Canon Inc Charged particle beam device
JPH07153655A (en) * 1993-11-29 1995-06-16 Nec Corp Electron-beam aligner
JPH07192682A (en) * 1993-12-27 1995-07-28 Agency Of Ind Science & Technol Device and method for irradiation by multielectron beam
JP2011181416A (en) * 2010-03-02 2011-09-15 Tohoku Univ Light switching electron source and electron beam drawing device using the same

Also Published As

Publication number Publication date
JPS6367742B2 (en) 1988-12-27

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