JPS571820B2 - - Google Patents
Info
- Publication number
- JPS571820B2 JPS571820B2 JP8897878A JP8897878A JPS571820B2 JP S571820 B2 JPS571820 B2 JP S571820B2 JP 8897878 A JP8897878 A JP 8897878A JP 8897878 A JP8897878 A JP 8897878A JP S571820 B2 JPS571820 B2 JP S571820B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8897878A JPS5517112A (en) | 1978-07-21 | 1978-07-21 | Positive type radiation sensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8897878A JPS5517112A (en) | 1978-07-21 | 1978-07-21 | Positive type radiation sensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5517112A JPS5517112A (en) | 1980-02-06 |
| JPS571820B2 true JPS571820B2 (OSRAM) | 1982-01-13 |
Family
ID=13957880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8897878A Granted JPS5517112A (en) | 1978-07-21 | 1978-07-21 | Positive type radiation sensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5517112A (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS632784U (OSRAM) * | 1986-06-20 | 1988-01-09 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0061689B1 (en) * | 1981-03-27 | 1986-08-27 | Hitachi, Ltd. | Radiation sensitive polymer materials |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5914733B2 (ja) * | 1974-12-04 | 1984-04-05 | プロセス資材 （株） | 画像形成用材料 |
| US4011351A (en) * | 1975-01-29 | 1977-03-08 | International Business Machines Corporation | Preparation of resist image with methacrylate polymers |
| JPS5290269A (en) * | 1976-01-23 | 1977-07-29 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for fine resist patterns |
| JPS52146217A (en) * | 1976-05-31 | 1977-12-05 | Toshiba Corp | Positive type radiation sensitive material |
-
1978
- 1978-07-21 JP JP8897878A patent/JPS5517112A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS632784U (OSRAM) * | 1986-06-20 | 1988-01-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5517112A (en) | 1980-02-06 |