JPS57169084A - Vacuum vapor-depositing device of crystal resonator - Google Patents
Vacuum vapor-depositing device of crystal resonatorInfo
- Publication number
- JPS57169084A JPS57169084A JP5404781A JP5404781A JPS57169084A JP S57169084 A JPS57169084 A JP S57169084A JP 5404781 A JP5404781 A JP 5404781A JP 5404781 A JP5404781 A JP 5404781A JP S57169084 A JPS57169084 A JP S57169084A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- saucer
- gold
- subsequently
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5404781A JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5404781A JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57169084A true JPS57169084A (en) | 1982-10-18 |
| JPH025818B2 JPH025818B2 (cs) | 1990-02-06 |
Family
ID=12959685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5404781A Granted JPS57169084A (en) | 1981-04-10 | 1981-04-10 | Vacuum vapor-depositing device of crystal resonator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57169084A (cs) |
-
1981
- 1981-04-10 JP JP5404781A patent/JPS57169084A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH025818B2 (cs) | 1990-02-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE413688T1 (de) | Rotierende magnetanordnung und zerstäubungsquelle | |
| GB2102199B (en) | Piezo-electric resonator | |
| JPS57169084A (en) | Vacuum vapor-depositing device of crystal resonator | |
| JPS57169085A (en) | Vacuum vapor-depositing device of crystal resonator | |
| FR2445029A1 (fr) | Resonateur piezoelectrique a tiroir | |
| GB1181739A (en) | Switching Mechanism with Adjustable Timing Means | |
| JPS57169086A (en) | Vacuum vapor-depositing device of crystal resonator | |
| ATE107968T1 (de) | Ionenimplantationsanlage zum gleichmässigen einschuss eines ionenstrahls in ein substrat. | |
| JPS57169087A (en) | Vacuum vapor-deposition device of crystal resonator | |
| DK2883D0 (da) | Apparat til beskikning af fordampere i padampningsanlaeg | |
| JPS5518127A (en) | Piezoelectric ceramic filter | |
| JPS5435178A (en) | Ultrafine particle depositing apparatus | |
| JPS6475677A (en) | Film forming device | |
| JPS5462984A (en) | Masking deposition method | |
| RU1782400C (ru) | Высевающий аппарат | |
| ES2013539A6 (es) | Dosificador de semillas para maquinas sembradoras. | |
| JPS55117321A (en) | Crystal oscillator | |
| JPS57113607A (en) | Frequency adjuster for quartz oscillator | |
| JPS6411965A (en) | Thin film forming device | |
| SU1545974A1 (ru) | Высевающий аппарат точного высева | |
| JPS553634A (en) | Etching device | |
| JPS5538566A (en) | Orientation method of liquid crystal cell substrate | |
| JPS52145380A (en) | Sputtering apparatus | |
| PRZYBYSZEWSKI et al. | Method and apparatus for sputtering utilizing an apertured electrode and a pulsed substrate bias(Technique and equipment for sputtering using apertured electrode and pulsed substrate bias)[Patent] | |
| JPS5217866A (en) | Crystal oscillation clock |