JPS57163364A - Novel o-naphthoquinone diazide compound - Google Patents

Novel o-naphthoquinone diazide compound

Info

Publication number
JPS57163364A
JPS57163364A JP4971781A JP4971781A JPS57163364A JP S57163364 A JPS57163364 A JP S57163364A JP 4971781 A JP4971781 A JP 4971781A JP 4971781 A JP4971781 A JP 4971781A JP S57163364 A JPS57163364 A JP S57163364A
Authority
JP
Japan
Prior art keywords
formula
naphthoquinone
diazide
compound
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4971781A
Other languages
Japanese (ja)
Other versions
JPH0161103B2 (en
Inventor
Teruo Nagano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP4971781A priority Critical patent/JPS57163364A/en
Publication of JPS57163364A publication Critical patent/JPS57163364A/en
Publication of JPH0161103B2 publication Critical patent/JPH0161103B2/ja
Granted legal-status Critical Current

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  • Hydrogenated Pyridines (AREA)
  • Pyrrole Compounds (AREA)
  • Indole Compounds (AREA)
  • Other In-Based Heterocyclic Compounds (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)

Abstract

NEW MATERIAL:O-Naphthoquinone diazide compounds shown by the formulasI (R1 and R2 are H, 1W12C alkyl), the formula II, the formula III (R3 is H, phenyl), the formula IV (Z is tetramethylene, etc.), the formula V (R4 is H, 1W6C alkyl), the formula IV (X1WX4 are Cl, Br) and the formula VII.
EXAMPLE: N-(1,2-Naphthoquinone-2-diazide-4-sulfonyloxy)phthalic acid imide.
USE: A photosensitive resist-forming compound. Useful for preparing a plano- graphic plate, IC circuit, photomasking, by providing a visible image without development by exposure.
PROCESS: A compound shown by the formula VIII (A is a compound of the part of the dotted line of the formula IX in the formulaIW formula VII) is condensed with 1,2-naphthoquinone-2-diazide-4-sulfonic acid chloride through dehydrochlorination in the presence of a dehydrochlorinating agent, to give compounds shown by the formulasIWVII.
COPYRIGHT: (C)1982,JPO&Japio
JP4971781A 1981-04-01 1981-04-01 Novel o-naphthoquinone diazide compound Granted JPS57163364A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4971781A JPS57163364A (en) 1981-04-01 1981-04-01 Novel o-naphthoquinone diazide compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4971781A JPS57163364A (en) 1981-04-01 1981-04-01 Novel o-naphthoquinone diazide compound

Publications (2)

Publication Number Publication Date
JPS57163364A true JPS57163364A (en) 1982-10-07
JPH0161103B2 JPH0161103B2 (en) 1989-12-27

Family

ID=12838934

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4971781A Granted JPS57163364A (en) 1981-04-01 1981-04-01 Novel o-naphthoquinone diazide compound

Country Status (1)

Country Link
JP (1) JPS57163364A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63220138A (en) * 1987-03-09 1988-09-13 Daicel Chem Ind Ltd Photosensitive resin composition for screen plate making

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63220138A (en) * 1987-03-09 1988-09-13 Daicel Chem Ind Ltd Photosensitive resin composition for screen plate making

Also Published As

Publication number Publication date
JPH0161103B2 (en) 1989-12-27

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