JPS57140169U - - Google Patents
Info
- Publication number
- JPS57140169U JPS57140169U JP2727481U JP2727481U JPS57140169U JP S57140169 U JPS57140169 U JP S57140169U JP 2727481 U JP2727481 U JP 2727481U JP 2727481 U JP2727481 U JP 2727481U JP S57140169 U JPS57140169 U JP S57140169U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2727481U JPS57140169U (ja) | 1981-02-27 | 1981-02-27 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2727481U JPS57140169U (ja) | 1981-02-27 | 1981-02-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57140169U true JPS57140169U (ja) | 1982-09-02 |
Family
ID=29824995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2727481U Pending JPS57140169U (ja) | 1981-02-27 | 1981-02-27 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57140169U (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02278641A (ja) * | 1989-04-20 | 1990-11-14 | Hitachi Ltd | 電子レンズの冷却系 |
| EP3200216A1 (en) * | 2016-01-26 | 2017-08-02 | Advantest Corporation | Charged particle beam lens apparatus, charged particle beam column, and charged particle beam exposure apparatus |
| WO2020108984A3 (en) * | 2018-11-30 | 2020-07-30 | Asml Netherlands B.V. | Systems and methods of cooling objective lens of a charged-particle beam system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5336169A (en) * | 1976-09-16 | 1978-04-04 | Hitachi Ltd | Electron lens |
-
1981
- 1981-02-27 JP JP2727481U patent/JPS57140169U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5336169A (en) * | 1976-09-16 | 1978-04-04 | Hitachi Ltd | Electron lens |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02278641A (ja) * | 1989-04-20 | 1990-11-14 | Hitachi Ltd | 電子レンズの冷却系 |
| EP3200216A1 (en) * | 2016-01-26 | 2017-08-02 | Advantest Corporation | Charged particle beam lens apparatus, charged particle beam column, and charged particle beam exposure apparatus |
| CN107017142A (zh) * | 2016-01-26 | 2017-08-04 | 爱德万测试株式会社 | 带电粒子束透镜装置、带电粒子束柱及带电粒子束曝光装置 |
| WO2020108984A3 (en) * | 2018-11-30 | 2020-07-30 | Asml Netherlands B.V. | Systems and methods of cooling objective lens of a charged-particle beam system |