JPS57131250U - - Google Patents
Info
- Publication number
- JPS57131250U JPS57131250U JP1620481U JP1620481U JPS57131250U JP S57131250 U JPS57131250 U JP S57131250U JP 1620481 U JP1620481 U JP 1620481U JP 1620481 U JP1620481 U JP 1620481U JP S57131250 U JPS57131250 U JP S57131250U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1620481U JPS57131250U (enExample) | 1981-02-07 | 1981-02-07 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1620481U JPS57131250U (enExample) | 1981-02-07 | 1981-02-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57131250U true JPS57131250U (enExample) | 1982-08-16 |
Family
ID=29814185
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1620481U Pending JPS57131250U (enExample) | 1981-02-07 | 1981-02-07 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57131250U (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1981
- 1981-02-07 JP JP1620481U patent/JPS57131250U/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |