JPS57124730A - Water soluble photosensitive resin composition - Google Patents
Water soluble photosensitive resin compositionInfo
- Publication number
- JPS57124730A JPS57124730A JP1060781A JP1060781A JPS57124730A JP S57124730 A JPS57124730 A JP S57124730A JP 1060781 A JP1060781 A JP 1060781A JP 1060781 A JP1060781 A JP 1060781A JP S57124730 A JPS57124730 A JP S57124730A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- water soluble
- photosensitive resin
- photopolymn
- 100pts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 2
- 239000011342 resin composition Substances 0.000 title 1
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 3
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229920005862 polyol Polymers 0.000 abstract 2
- 150000003077 polyols Chemical class 0.000 abstract 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 230000008030 elimination Effects 0.000 abstract 1
- 238000003379 elimination reaction Methods 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 abstract 1
- 229920002689 polyvinyl acetate Polymers 0.000 abstract 1
- 239000011118 polyvinyl acetate Substances 0.000 abstract 1
- 238000007127 saponification reaction Methods 0.000 abstract 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Graft Or Block Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1060781A JPS57124730A (en) | 1981-01-27 | 1981-01-27 | Water soluble photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1060781A JPS57124730A (en) | 1981-01-27 | 1981-01-27 | Water soluble photosensitive resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57124730A true JPS57124730A (en) | 1982-08-03 |
| JPS6364769B2 JPS6364769B2 (enrdf_load_stackoverflow) | 1988-12-13 |
Family
ID=11754922
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1060781A Granted JPS57124730A (en) | 1981-01-27 | 1981-01-27 | Water soluble photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57124730A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6429836A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Heating type keep plate cross linkable by photopolymerization |
| US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
| JP2010113341A (ja) * | 2008-10-08 | 2010-05-20 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
-
1981
- 1981-01-27 JP JP1060781A patent/JPS57124730A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6429836A (en) * | 1987-06-13 | 1989-01-31 | Basf Ag | Heating type keep plate cross linkable by photopolymerization |
| US5786127A (en) * | 1996-08-15 | 1998-07-28 | Western Litho Plate & Supply Co. | Photosensitive element having an overcoat which increases photo-speed and is substantially impermeable to oxygen |
| JP2010113341A (ja) * | 2008-10-08 | 2010-05-20 | Tdk Corp | ホログラム記録材料及びホログラム記録媒体 |
| US8617772B2 (en) * | 2008-10-08 | 2013-12-31 | Tdk Corporation | Hologram recording material and hologram recording medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6364769B2 (enrdf_load_stackoverflow) | 1988-12-13 |
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