JPS57117238U - - Google Patents
Info
- Publication number
- JPS57117238U JPS57117238U JP471481U JP471481U JPS57117238U JP S57117238 U JPS57117238 U JP S57117238U JP 471481 U JP471481 U JP 471481U JP 471481 U JP471481 U JP 471481U JP S57117238 U JPS57117238 U JP S57117238U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP471481U JPS6113794Y2 (en:Method) | 1981-01-16 | 1981-01-16 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP471481U JPS6113794Y2 (en:Method) | 1981-01-16 | 1981-01-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57117238U true JPS57117238U (en:Method) | 1982-07-20 |
| JPS6113794Y2 JPS6113794Y2 (en:Method) | 1986-04-28 |
Family
ID=29803119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP471481U Expired JPS6113794Y2 (en:Method) | 1981-01-16 | 1981-01-16 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6113794Y2 (en:Method) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8836929B2 (en) | 2002-12-20 | 2014-09-16 | Carl Zeiss Smt Gmbh | Device and method for the optical measurement of an optical system by using an immersion fluid |
| US8902401B2 (en) | 2006-05-09 | 2014-12-02 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |
| US9429495B2 (en) | 2004-06-04 | 2016-08-30 | Carl Zeiss Smt Gmbh | System for measuring the image quality of an optical imaging system |
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
-
1981
- 1981-01-16 JP JP471481U patent/JPS6113794Y2/ja not_active Expired
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8836929B2 (en) | 2002-12-20 | 2014-09-16 | Carl Zeiss Smt Gmbh | Device and method for the optical measurement of an optical system by using an immersion fluid |
| US9436095B2 (en) | 2004-01-20 | 2016-09-06 | Carl Zeiss Smt Gmbh | Exposure apparatus and measuring device for a projection lens |
| US9429495B2 (en) | 2004-06-04 | 2016-08-30 | Carl Zeiss Smt Gmbh | System for measuring the image quality of an optical imaging system |
| US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9104117B2 (en) | 2004-07-07 | 2015-08-11 | Bob Streefkerk | Lithographic apparatus having a liquid detection system |
| US8902401B2 (en) | 2006-05-09 | 2014-12-02 | Carl Zeiss Smt Gmbh | Optical imaging device with thermal attenuation |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6113794Y2 (en:Method) | 1986-04-28 |