JPS568533A - Static measuring method for metallic texture - Google Patents

Static measuring method for metallic texture

Info

Publication number
JPS568533A
JPS568533A JP8379579A JP8379579A JPS568533A JP S568533 A JPS568533 A JP S568533A JP 8379579 A JP8379579 A JP 8379579A JP 8379579 A JP8379579 A JP 8379579A JP S568533 A JPS568533 A JP S568533A
Authority
JP
Japan
Prior art keywords
waveheight
ray
sample
rays
diffraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8379579A
Other languages
Japanese (ja)
Other versions
JPS642895B2 (en
Inventor
Michio Katayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP8379579A priority Critical patent/JPS568533A/en
Publication of JPS568533A publication Critical patent/JPS568533A/en
Publication of JPS642895B2 publication Critical patent/JPS642895B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To realize an extremely quick and high-accuracy measurement for the texture of the metal rolled plate, by irradiating the continuous X-rays to the test sample and then detecting for counting the diffraction X-ray sent from the sample through the semiconductor detector fixed at the constant diffraction angle position. CONSTITUTION:The continuous X-rays generated from the X-ray tube are changed into the parallel beams through the incident solar slit, and the parallel component is put in directly in a plate form and with an angle secured. The X-ray having the specific energy among those components reaches the semiconductor detector located at the position symmetrical to the X-ray source and against the sample normal line in the form of the diffracted line on the (hkl) face. Here the X-rays amplified after converted into the electric pulse are analyzed by the multiple waveheight analyzer for selection of the waveheight level of the pulse. And then the energy analysis process is given to these waveheight levels, and these data are multi-integrated to the memory region correspoonding to each waveheight level. The CPU eliminates the background after the A/D conversion to secure the correspondence of the data to the random sample diffraction X-ray intensity within the memory and through the waveform number process. Thus the axial density distribution can be obtained through a simple method.
JP8379579A 1979-07-02 1979-07-02 Static measuring method for metallic texture Granted JPS568533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8379579A JPS568533A (en) 1979-07-02 1979-07-02 Static measuring method for metallic texture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8379579A JPS568533A (en) 1979-07-02 1979-07-02 Static measuring method for metallic texture

Publications (2)

Publication Number Publication Date
JPS568533A true JPS568533A (en) 1981-01-28
JPS642895B2 JPS642895B2 (en) 1989-01-19

Family

ID=13812576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8379579A Granted JPS568533A (en) 1979-07-02 1979-07-02 Static measuring method for metallic texture

Country Status (1)

Country Link
JP (1) JPS568533A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017695A (en) * 1973-06-14 1975-02-25
JPS55158544A (en) * 1979-05-29 1980-12-10 Kawasaki Steel Corp On-line measuring method of and apparatus for aggregation structure

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5017695A (en) * 1973-06-14 1975-02-25
JPS55158544A (en) * 1979-05-29 1980-12-10 Kawasaki Steel Corp On-line measuring method of and apparatus for aggregation structure

Also Published As

Publication number Publication date
JPS642895B2 (en) 1989-01-19

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