JPS568489B2 - - Google Patents

Info

Publication number
JPS568489B2
JPS568489B2 JP11539374A JP11539374A JPS568489B2 JP S568489 B2 JPS568489 B2 JP S568489B2 JP 11539374 A JP11539374 A JP 11539374A JP 11539374 A JP11539374 A JP 11539374A JP S568489 B2 JPS568489 B2 JP S568489B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11539374A
Other languages
Japanese (ja)
Other versions
JPS5141966A (sv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11539374A priority Critical patent/JPS568489B2/ja
Publication of JPS5141966A publication Critical patent/JPS5141966A/ja
Publication of JPS568489B2 publication Critical patent/JPS568489B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
JP11539374A 1974-10-07 1974-10-07 Expired JPS568489B2 (sv)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11539374A JPS568489B2 (sv) 1974-10-07 1974-10-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11539374A JPS568489B2 (sv) 1974-10-07 1974-10-07

Publications (2)

Publication Number Publication Date
JPS5141966A JPS5141966A (sv) 1976-04-08
JPS568489B2 true JPS568489B2 (sv) 1981-02-24

Family

ID=14661430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11539374A Expired JPS568489B2 (sv) 1974-10-07 1974-10-07

Country Status (1)

Country Link
JP (1) JPS568489B2 (sv)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2624117A1 (de) * 1976-05-28 1977-12-08 Graenges Nyby Ab Zaehe ferritische staehle und verwendung derselben fuer metallische gegenstaende, insbesondere geschweisste konstruktionen
JPS5698893A (en) * 1980-01-08 1981-08-08 Seikosha Kk Method of manufacturing circuit board
JPS6159449A (ja) * 1984-08-31 1986-03-26 Fujitsu Ltd 半導体製造用マスク

Also Published As

Publication number Publication date
JPS5141966A (sv) 1976-04-08

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