JPS568489B2 - - Google Patents
Info
- Publication number
- JPS568489B2 JPS568489B2 JP11539374A JP11539374A JPS568489B2 JP S568489 B2 JPS568489 B2 JP S568489B2 JP 11539374 A JP11539374 A JP 11539374A JP 11539374 A JP11539374 A JP 11539374A JP S568489 B2 JPS568489 B2 JP S568489B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
Landscapes
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11539374A JPS568489B2 (no) | 1974-10-07 | 1974-10-07 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11539374A JPS568489B2 (no) | 1974-10-07 | 1974-10-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5141966A JPS5141966A (no) | 1976-04-08 |
JPS568489B2 true JPS568489B2 (no) | 1981-02-24 |
Family
ID=14661430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11539374A Expired JPS568489B2 (no) | 1974-10-07 | 1974-10-07 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS568489B2 (no) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2624117A1 (de) * | 1976-05-28 | 1977-12-08 | Graenges Nyby Ab | Zaehe ferritische staehle und verwendung derselben fuer metallische gegenstaende, insbesondere geschweisste konstruktionen |
JPS5698893A (en) * | 1980-01-08 | 1981-08-08 | Seikosha Kk | Method of manufacturing circuit board |
JPS6159449A (ja) * | 1984-08-31 | 1986-03-26 | Fujitsu Ltd | 半導体製造用マスク |
-
1974
- 1974-10-07 JP JP11539374A patent/JPS568489B2/ja not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5141966A (no) | 1976-04-08 |