JPS568489B2 - - Google Patents

Info

Publication number
JPS568489B2
JPS568489B2 JP11539374A JP11539374A JPS568489B2 JP S568489 B2 JPS568489 B2 JP S568489B2 JP 11539374 A JP11539374 A JP 11539374A JP 11539374 A JP11539374 A JP 11539374A JP S568489 B2 JPS568489 B2 JP S568489B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11539374A
Other languages
Japanese (ja)
Other versions
JPS5141966A (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11539374A priority Critical patent/JPS568489B2/ja
Publication of JPS5141966A publication Critical patent/JPS5141966A/ja
Publication of JPS568489B2 publication Critical patent/JPS568489B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
JP11539374A 1974-10-07 1974-10-07 Expired JPS568489B2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11539374A JPS568489B2 (enrdf_load_html_response) 1974-10-07 1974-10-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11539374A JPS568489B2 (enrdf_load_html_response) 1974-10-07 1974-10-07

Publications (2)

Publication Number Publication Date
JPS5141966A JPS5141966A (enrdf_load_html_response) 1976-04-08
JPS568489B2 true JPS568489B2 (enrdf_load_html_response) 1981-02-24

Family

ID=14661430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11539374A Expired JPS568489B2 (enrdf_load_html_response) 1974-10-07 1974-10-07

Country Status (1)

Country Link
JP (1) JPS568489B2 (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2624117A1 (de) * 1976-05-28 1977-12-08 Graenges Nyby Ab Zaehe ferritische staehle und verwendung derselben fuer metallische gegenstaende, insbesondere geschweisste konstruktionen
JPS5698893A (en) * 1980-01-08 1981-08-08 Seikosha Kk Method of manufacturing circuit board
JPS6159449A (ja) * 1984-08-31 1986-03-26 Fujitsu Ltd 半導体製造用マスク

Also Published As

Publication number Publication date
JPS5141966A (enrdf_load_html_response) 1976-04-08

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