JPS5678457U - - Google Patents
Info
- Publication number
- JPS5678457U JPS5678457U JP15837179U JP15837179U JPS5678457U JP S5678457 U JPS5678457 U JP S5678457U JP 15837179 U JP15837179 U JP 15837179U JP 15837179 U JP15837179 U JP 15837179U JP S5678457 U JPS5678457 U JP S5678457U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15837179U JPS5678457U (en) | 1979-11-15 | 1979-11-15 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15837179U JPS5678457U (en) | 1979-11-15 | 1979-11-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5678457U true JPS5678457U (en) | 1981-06-25 |
Family
ID=29669619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15837179U Pending JPS5678457U (en) | 1979-11-15 | 1979-11-15 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5678457U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02146728A (en) * | 1989-08-30 | 1990-06-05 | Hitachi Ltd | Plasma etching and device therefor |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52126177A (en) * | 1976-04-15 | 1977-10-22 | Hitachi Ltd | Etching device |
JPS53123669A (en) * | 1977-04-05 | 1978-10-28 | Fujitsu Ltd | Wafer holding method |
JPS5458362A (en) * | 1977-10-19 | 1979-05-11 | Hitachi Ltd | Dry etching method |
-
1979
- 1979-11-15 JP JP15837179U patent/JPS5678457U/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52126177A (en) * | 1976-04-15 | 1977-10-22 | Hitachi Ltd | Etching device |
JPS53123669A (en) * | 1977-04-05 | 1978-10-28 | Fujitsu Ltd | Wafer holding method |
JPS5458362A (en) * | 1977-10-19 | 1979-05-11 | Hitachi Ltd | Dry etching method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02146728A (en) * | 1989-08-30 | 1990-06-05 | Hitachi Ltd | Plasma etching and device therefor |