JPS5672440A - Developing liquid composition for lithographic plate - Google Patents

Developing liquid composition for lithographic plate

Info

Publication number
JPS5672440A
JPS5672440A JP15025579A JP15025579A JPS5672440A JP S5672440 A JPS5672440 A JP S5672440A JP 15025579 A JP15025579 A JP 15025579A JP 15025579 A JP15025579 A JP 15025579A JP S5672440 A JPS5672440 A JP S5672440A
Authority
JP
Japan
Prior art keywords
acid
organic
carbonate
main chain
lithographic plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15025579A
Other languages
Japanese (ja)
Inventor
Shigeki Shimizu
Akinobu Oshima
Tokuaki Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP15025579A priority Critical patent/JPS5672440A/en
Publication of JPS5672440A publication Critical patent/JPS5672440A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Abstract

PURPOSE:To obtain a superior printing master, by adding an organic carbonate, a mineral acid, and one or more of organic carboxylic aicd and sulfonic acid to a printing master developer having a coat layer of a photosensitive polymer having a specified unsaturated carboxylic acid ester in the main chain. CONSTITUTION:A photosensitive layer made of a photosensitive polymer having in the main chain a group represented by the formula, X, Y being H, halogen, CN, or NO2, and (n) being 1 or 2, such as a condensation product from p-phenylenediacrylic acid, bisphenol A, and triethylene glycol is formed on an aluminum plate made hydrophilic. A lithographic plate having a superior image free from ground stain is obtained by using a developer containing an organic carbonate such as ethylene carbonate, one or more acids of a group of a mineral acid, such as phosphoric acid or hydrochloric acid, an organic acid such as acetic acid, and an organic sulfonic acid such as benzenesulfonic acid, and a good solvent such as ethylene glycol monophenyl ether.
JP15025579A 1979-11-20 1979-11-20 Developing liquid composition for lithographic plate Pending JPS5672440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15025579A JPS5672440A (en) 1979-11-20 1979-11-20 Developing liquid composition for lithographic plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15025579A JPS5672440A (en) 1979-11-20 1979-11-20 Developing liquid composition for lithographic plate

Publications (1)

Publication Number Publication Date
JPS5672440A true JPS5672440A (en) 1981-06-16

Family

ID=15492937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15025579A Pending JPS5672440A (en) 1979-11-20 1979-11-20 Developing liquid composition for lithographic plate

Country Status (1)

Country Link
JP (1) JPS5672440A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05216242A (en) * 1991-10-22 1993-08-27 Internatl Business Mach Corp <Ibm> Solvent composition for development of photoresist and strip
WO2014178285A1 (en) * 2013-05-02 2014-11-06 富士フイルム株式会社 Pattern-forming method, electronic device and method for producing same, and developing fluid

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05216242A (en) * 1991-10-22 1993-08-27 Internatl Business Mach Corp <Ibm> Solvent composition for development of photoresist and strip
WO2014178285A1 (en) * 2013-05-02 2014-11-06 富士フイルム株式会社 Pattern-forming method, electronic device and method for producing same, and developing fluid
JP2014219487A (en) * 2013-05-02 2014-11-20 富士フイルム株式会社 Pattern formation method, electronic device and method of manufacturing the same, developer

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