Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filedfiledCritical
Priority to JP4563275ApriorityCriticalpatent/JPS51120713A/ja
Publication of JPS51120713ApublicationCriticalpatent/JPS51120713A/ja
Publication of JPS5654618B2publicationCriticalpatent/JPS5654618B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/022—Quinonediazides
G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
Physics & Mathematics
(AREA)
Spectroscopy & Molecular Physics
(AREA)
General Physics & Mathematics
(AREA)
Compositions Of Macromolecular Compounds
(AREA)
JP4563275A1975-04-151975-04-15Positive type photo-resistant compound
GrantedJPS51120713A
(en)