JPS5653854B2 - - Google Patents
Info
- Publication number
- JPS5653854B2 JPS5653854B2 JP12307575A JP12307575A JPS5653854B2 JP S5653854 B2 JPS5653854 B2 JP S5653854B2 JP 12307575 A JP12307575 A JP 12307575A JP 12307575 A JP12307575 A JP 12307575A JP S5653854 B2 JPS5653854 B2 JP S5653854B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Led Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12307575A JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12307575A JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5247377A JPS5247377A (en) | 1977-04-15 |
| JPS5653854B2 true JPS5653854B2 (en) | 1981-12-22 |
Family
ID=14851560
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12307575A Granted JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5247377A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2571542B1 (en) * | 1984-10-09 | 1987-01-23 | Labo Electronique Physique | PROCESS FOR PRODUCING A SEMICONDUCTOR DEVICE INCLUDING THE ACTION OF PLASMA |
| JP2004043281A (en) * | 2002-05-16 | 2004-02-12 | Ngk Insulators Ltd | Epitaxial substrate |
| JP4209136B2 (en) * | 2002-05-30 | 2009-01-14 | パナソニック株式会社 | Semiconductor device and manufacturing method thereof |
| JP2009016848A (en) * | 2008-07-14 | 2009-01-22 | Panasonic Corp | Semiconductor device, and manufacturing method thereof |
| CN103456603B (en) * | 2013-09-05 | 2016-04-13 | 大连理工大学 | Gallium system heterogeneous semiconductor substrate is prepared method and the gallium oxide film of gallium oxide film |
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1975
- 1975-10-13 JP JP12307575A patent/JPS5247377A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5247377A (en) | 1977-04-15 |