JPS5646531Y2 - - Google Patents

Info

Publication number
JPS5646531Y2
JPS5646531Y2 JP16114176U JP16114176U JPS5646531Y2 JP S5646531 Y2 JPS5646531 Y2 JP S5646531Y2 JP 16114176 U JP16114176 U JP 16114176U JP 16114176 U JP16114176 U JP 16114176U JP S5646531 Y2 JPS5646531 Y2 JP S5646531Y2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16114176U
Other versions
JPS5377351U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16114176U priority Critical patent/JPS5646531Y2/ja
Publication of JPS5377351U publication Critical patent/JPS5377351U/ja
Application granted granted Critical
Publication of JPS5646531Y2 publication Critical patent/JPS5646531Y2/ja
Expired legal-status Critical Current

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  • Breakers (AREA)
JP16114176U 1976-11-30 1976-11-30 Expired JPS5646531Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16114176U JPS5646531Y2 (ja) 1976-11-30 1976-11-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16114176U JPS5646531Y2 (ja) 1976-11-30 1976-11-30

Publications (2)

Publication Number Publication Date
JPS5377351U JPS5377351U (ja) 1978-06-28
JPS5646531Y2 true JPS5646531Y2 (ja) 1981-10-30

Family

ID=28768984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16114176U Expired JPS5646531Y2 (ja) 1976-11-30 1976-11-30

Country Status (1)

Country Link
JP (1) JPS5646531Y2 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8846517B2 (en) 2012-07-06 2014-09-30 Micron Technology, Inc. Methods of forming a pattern on a substrate
US8852851B2 (en) 2006-07-10 2014-10-07 Micron Technology, Inc. Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
US8901700B2 (en) 2008-05-05 2014-12-02 Micron Technology, Inc. Semiconductor structures
US9153458B2 (en) 2011-05-05 2015-10-06 Micron Technology, Inc. Methods of forming a pattern on a substrate
US9330934B2 (en) 2009-05-18 2016-05-03 Micron Technology, Inc. Methods of forming patterns on substrates

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8852851B2 (en) 2006-07-10 2014-10-07 Micron Technology, Inc. Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same
US8901700B2 (en) 2008-05-05 2014-12-02 Micron Technology, Inc. Semiconductor structures
US9330934B2 (en) 2009-05-18 2016-05-03 Micron Technology, Inc. Methods of forming patterns on substrates
US9153458B2 (en) 2011-05-05 2015-10-06 Micron Technology, Inc. Methods of forming a pattern on a substrate
US8846517B2 (en) 2012-07-06 2014-09-30 Micron Technology, Inc. Methods of forming a pattern on a substrate

Also Published As

Publication number Publication date
JPS5377351U (ja) 1978-06-28

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