JPS5645291B2 - - Google Patents
Info
- Publication number
- JPS5645291B2 JPS5645291B2 JP473876A JP473876A JPS5645291B2 JP S5645291 B2 JPS5645291 B2 JP S5645291B2 JP 473876 A JP473876 A JP 473876A JP 473876 A JP473876 A JP 473876A JP S5645291 B2 JPS5645291 B2 JP S5645291B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP473876A JPS5287985A (en) | 1976-01-19 | 1976-01-19 | Plasma etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP473876A JPS5287985A (en) | 1976-01-19 | 1976-01-19 | Plasma etching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5287985A JPS5287985A (en) | 1977-07-22 |
| JPS5645291B2 true JPS5645291B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-10-26 |
Family
ID=11592241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP473876A Granted JPS5287985A (en) | 1976-01-19 | 1976-01-19 | Plasma etching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5287985A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54158343A (en) * | 1978-06-05 | 1979-12-14 | Hitachi Ltd | Dry etching method for al and al alloy |
| US4182646A (en) * | 1978-07-27 | 1980-01-08 | John Zajac | Process of etching with plasma etch gas |
| JPS55132038A (en) * | 1979-04-02 | 1980-10-14 | Matsushita Electronics Corp | Forming method for metallic electrode on semiconductor substrate |
| JPS55166925A (en) * | 1979-06-13 | 1980-12-26 | Matsushita Electronics Corp | Application of metal film on semiconductor substrate |
| US6786997B1 (en) | 1984-11-26 | 2004-09-07 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5441870B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-11-22 | 1979-12-11 |
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1976
- 1976-01-19 JP JP473876A patent/JPS5287985A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5287985A (en) | 1977-07-22 |