JPS5645127B2 - - Google Patents
Info
- Publication number
- JPS5645127B2 JPS5645127B2 JP2213374A JP2213374A JPS5645127B2 JP S5645127 B2 JPS5645127 B2 JP S5645127B2 JP 2213374 A JP2213374 A JP 2213374A JP 2213374 A JP2213374 A JP 2213374A JP S5645127 B2 JPS5645127 B2 JP S5645127B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2213374A JPS5645127B2 (US07122603-20061017-C00045.png) | 1974-02-25 | 1974-02-25 | |
| US05/552,902 US4028111A (en) | 1974-02-25 | 1975-02-25 | Light-sensitive lithographic printing plate |
| GB7921/75A GB1490284A (en) | 1974-02-25 | 1975-02-25 | Light-sensitive lithographic printing plate precursors |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2213374A JPS5645127B2 (US07122603-20061017-C00045.png) | 1974-02-25 | 1974-02-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50117503A JPS50117503A (US07122603-20061017-C00045.png) | 1975-09-13 |
| JPS5645127B2 true JPS5645127B2 (US07122603-20061017-C00045.png) | 1981-10-24 |
Family
ID=12074383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2213374A Expired JPS5645127B2 (US07122603-20061017-C00045.png) | 1974-02-25 | 1974-02-25 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4028111A (US07122603-20061017-C00045.png) |
| JP (1) | JPS5645127B2 (US07122603-20061017-C00045.png) |
| GB (1) | GB1490284A (US07122603-20061017-C00045.png) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4087584A (en) * | 1975-10-31 | 1978-05-02 | Ricoh Co., Ltd. | Lithographic printing plate |
| DE2846256A1 (de) * | 1977-10-24 | 1979-04-26 | Fuji Photo Film Co Ltd | Verfahren zur entwicklung positiv wirkender lichtempfindlicher planographischer druckplatten |
| US4212935A (en) * | 1978-02-24 | 1980-07-15 | International Business Machines Corporation | Method of modifying the development profile of photoresists |
| JPS5560944A (en) * | 1978-10-31 | 1980-05-08 | Fuji Photo Film Co Ltd | Image forming method |
| JPS55115045A (en) * | 1979-02-27 | 1980-09-04 | Fuji Photo Film Co Ltd | Printing plate preparation |
| GB2046931B (en) * | 1979-02-27 | 1983-03-16 | Fuji Photo Film Co Ltd | Method of developing positive-acting photosensitive lithographic printing plate precursor |
| US4299906A (en) * | 1979-06-01 | 1981-11-10 | American Hoechst Corporation | Light-sensitive color proofing film with surfactant in a light-sensitive coating |
| JPS5635130A (en) * | 1979-08-31 | 1981-04-07 | Fujitsu Ltd | Resist material and method for forming resist pattern |
| JPS57163234A (en) * | 1981-04-01 | 1982-10-07 | Fuji Photo Film Co Ltd | Photosensitive composition |
| BR8207853A (pt) * | 1981-09-08 | 1983-08-30 | Minnesota Mining & Mfg | Substrato litografico e seu processo de fabricacao |
| US4822722A (en) * | 1985-07-18 | 1989-04-18 | Petrarch Systems, Inc. | Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image |
| US4634652A (en) * | 1985-07-25 | 1987-01-06 | American Hoechst Corporation | Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein |
| DE3886616T2 (de) * | 1987-02-02 | 1994-07-21 | Nippon Paint Co Ltd | Positive photoempfindliche harzzubereitung und verfahren zur herstellung. |
| JP2608408B2 (ja) * | 1987-05-13 | 1997-05-07 | 日本ペイント株式会社 | ポジ型感光性樹脂組成物 |
| JPH0814696B2 (ja) * | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
| US5238771A (en) * | 1988-05-31 | 1993-08-24 | Konica Corporation | Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive |
| US5188032A (en) * | 1988-08-19 | 1993-02-23 | Presstek, Inc. | Metal-based lithographic plate constructions and methods of making same |
| US5210155A (en) * | 1990-08-24 | 1993-05-11 | Exxon Chemical Patents Inc. | Phenol terminated diester compositions derived from dicarboxylic acids, polyester polymers or alkyd polymers, and curable compositions containing same |
| US5166289A (en) * | 1990-12-19 | 1992-11-24 | Exxon Chemical Patents Inc. | Thermoset coating composition having improved hardness |
| US5242780A (en) * | 1991-10-18 | 1993-09-07 | Industrial Technology Research Institute | Electrophoretic positive working photosensitive composition comprising as the photosensitive ingredient an aliphatic polyester having o-quinone diazide on the side chain and end groups |
| JP3156945B2 (ja) * | 1993-03-24 | 2001-04-16 | 富士写真フイルム株式会社 | リード・フレーム形成用材の作製方法 |
| JP3290316B2 (ja) | 1994-11-18 | 2002-06-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
| JP3506295B2 (ja) | 1995-12-22 | 2004-03-15 | 富士写真フイルム株式会社 | ポジ型感光性平版印刷版 |
| US6491037B1 (en) | 2001-10-10 | 2002-12-10 | Daniel J. Mortenson | Temperature indicating mouth guard |
| US6786155B2 (en) * | 2002-04-26 | 2004-09-07 | Kodak Polychrome Graphics Llc | Dimensionally stable paper substrate for a precursor to an imaged member |
| DE602006009919D1 (de) | 2006-08-03 | 2009-12-03 | Agfa Graphics Nv | Flachdruckplattenträger |
| ATE441534T1 (de) * | 2007-03-19 | 2009-09-15 | Agfa Graphics Nv | Verfahren zur herstellung eines lithographischen druckplattenträgers |
| EP2065211B1 (en) | 2007-11-30 | 2010-05-26 | Agfa Graphics N.V. | A method for treating a lithographic printing plate |
| EP2098376B1 (en) | 2008-03-04 | 2013-09-18 | Agfa Graphics N.V. | A method for making a lithographic printing plate support |
| ES2365885T3 (es) * | 2008-03-31 | 2011-10-13 | Agfa Graphics N.V. | Un método para tratar una plancha de impresión litográfica. |
| EP3032334B1 (en) | 2014-12-08 | 2017-10-18 | Agfa Graphics Nv | A system for reducing ablation debris |
| CN108778744A (zh) | 2016-03-16 | 2018-11-09 | 爱克发有限公司 | 加工平版印刷版的方法和设备 |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3046121A (en) * | 1949-07-23 | 1962-07-24 | Azoplate Corp | Process for the manufacture of printing plates and light-sensitive material suttablefor use therein |
| DE907739C (de) * | 1949-07-23 | 1954-02-18 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares lichtempfindliches Material |
| BE506677A (US07122603-20061017-C00045.png) * | 1950-10-31 | |||
| NL255517A (US07122603-20061017-C00045.png) * | 1959-09-04 | |||
| GB1136544A (en) * | 1966-02-28 | 1968-12-11 | Agfa Gevaert Nv | Photochemical cross-linking of polymers |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| BE757066A (fr) * | 1969-10-03 | 1971-03-16 | Eastman Kodak Co | Composition photoconductrice contenant un sensibilisateur organique et procede electrophotographique utilisant cette composition pour former une image a contraste ameliore |
| NL165852C (nl) * | 1970-09-29 | 1981-05-15 | Hoechst Ag | Werkwijze voor het vervaardigen van een reprografisch kopieermateriaal door een lichtgevoelige laag aan te brengen op een drager. |
| US3890153A (en) * | 1971-03-13 | 1975-06-17 | Philips Corp | Positive-acting napthoquinone diazide photosensitive composition |
-
1974
- 1974-02-25 JP JP2213374A patent/JPS5645127B2/ja not_active Expired
-
1975
- 1975-02-25 GB GB7921/75A patent/GB1490284A/en not_active Expired
- 1975-02-25 US US05/552,902 patent/US4028111A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1314552A2 (en) | 1998-04-06 | 2003-05-28 | Fuji Photo Film Co., Ltd. | Photosensitive resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| US4028111A (en) | 1977-06-07 |
| GB1490284A (en) | 1977-10-26 |
| JPS50117503A (US07122603-20061017-C00045.png) | 1975-09-13 |
