JPS563661B2 - - Google Patents
Info
- Publication number
- JPS563661B2 JPS563661B2 JP14963376A JP14963376A JPS563661B2 JP S563661 B2 JPS563661 B2 JP S563661B2 JP 14963376 A JP14963376 A JP 14963376A JP 14963376 A JP14963376 A JP 14963376A JP S563661 B2 JPS563661 B2 JP S563661B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14963376A JPS5373079A (en) | 1976-12-13 | 1976-12-13 | Wafer reffernge method on projective exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14963376A JPS5373079A (en) | 1976-12-13 | 1976-12-13 | Wafer reffernge method on projective exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5373079A JPS5373079A (en) | 1978-06-29 |
| JPS563661B2 true JPS563661B2 (fr) | 1981-01-26 |
Family
ID=15479481
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14963376A Granted JPS5373079A (en) | 1976-12-13 | 1976-12-13 | Wafer reffernge method on projective exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5373079A (fr) |
-
1976
- 1976-12-13 JP JP14963376A patent/JPS5373079A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5373079A (en) | 1978-06-29 |