JPS5632138A - Photosensitive polyamide composition - Google Patents

Photosensitive polyamide composition

Info

Publication number
JPS5632138A
JPS5632138A JP10753379A JP10753379A JPS5632138A JP S5632138 A JPS5632138 A JP S5632138A JP 10753379 A JP10753379 A JP 10753379A JP 10753379 A JP10753379 A JP 10753379A JP S5632138 A JPS5632138 A JP S5632138A
Authority
JP
Japan
Prior art keywords
composition
hexahydro
acryloyl
triazine
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10753379A
Other languages
Japanese (ja)
Inventor
Kazuo Kitamura
Masao Iwamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP10753379A priority Critical patent/JPS5632138A/en
Publication of JPS5632138A publication Critical patent/JPS5632138A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Abstract

PURPOSE:To enhance the solvent resistance, etc. of the resulting photosensitive composition by blending hexahydro-1,3,5-acryloyl-s-triazine into a composition consisting essentially of soluble polyamide and a terminal unsatd. monomer having a radical polymerizable double bond. CONSTITUTION:A composition is prepared consisting of soluble polyamide (a) such as omega-aminocarboxylic acid polymer or diamino compound-dicarboxylic acid condensation polymer and a terminal unsated. monomer (b) having one or more radical polymerizable bonds represented by the formula (where R is H or alkyl). To 100pts.wt. this composition are added 0.5-5pts.wt. hexahydro-1,3,5-acryloyl-S-triazine and a photopolymn. initiator. Thus, the titled composition having superior solvent resistance, endurance, image reproducibility, etc. is obtd.
JP10753379A 1979-08-23 1979-08-23 Photosensitive polyamide composition Pending JPS5632138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10753379A JPS5632138A (en) 1979-08-23 1979-08-23 Photosensitive polyamide composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10753379A JPS5632138A (en) 1979-08-23 1979-08-23 Photosensitive polyamide composition

Publications (1)

Publication Number Publication Date
JPS5632138A true JPS5632138A (en) 1981-04-01

Family

ID=14461594

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10753379A Pending JPS5632138A (en) 1979-08-23 1979-08-23 Photosensitive polyamide composition

Country Status (1)

Country Link
JP (1) JPS5632138A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001064307A (en) * 1999-08-25 2001-03-13 Toyobo Co Ltd Photosensitive resin composition
WO2014021322A1 (en) * 2012-07-31 2014-02-06 東レ株式会社 Photosensitive resin composition and photosensitive resin printing plate precursor
JP2019147855A (en) * 2018-02-26 2019-09-05 株式会社クラレ Photosensitive resin composition and method of producing the same, and, use of the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014402A (en) * 1973-06-11 1975-02-15
JPS5131504A (en) * 1974-09-06 1976-03-17 Toray Industries KANKOSEIHORIAMIDOJUSHISOSEIBUTSU
JPS53117091A (en) * 1977-03-22 1978-10-13 Unitika Ltd Photosensitive polyamide
JPS53141026A (en) * 1977-05-14 1978-12-08 Toyo Boseki Sensitive resin composite forming relief

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5014402A (en) * 1973-06-11 1975-02-15
JPS5131504A (en) * 1974-09-06 1976-03-17 Toray Industries KANKOSEIHORIAMIDOJUSHISOSEIBUTSU
JPS53117091A (en) * 1977-03-22 1978-10-13 Unitika Ltd Photosensitive polyamide
JPS53141026A (en) * 1977-05-14 1978-12-08 Toyo Boseki Sensitive resin composite forming relief

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001064307A (en) * 1999-08-25 2001-03-13 Toyobo Co Ltd Photosensitive resin composition
JP4543291B2 (en) * 1999-08-25 2010-09-15 東洋紡績株式会社 Photosensitive resin composition
WO2014021322A1 (en) * 2012-07-31 2014-02-06 東レ株式会社 Photosensitive resin composition and photosensitive resin printing plate precursor
JP5601425B2 (en) * 2012-07-31 2014-10-08 東レ株式会社 Photosensitive resin composition and photosensitive resin printing plate precursor
US9678424B2 (en) 2012-07-31 2017-06-13 Toray Industries, Inc. Photosensitive resin composition and photosensitive resin printing plate original
JP2019147855A (en) * 2018-02-26 2019-09-05 株式会社クラレ Photosensitive resin composition and method of producing the same, and, use of the same

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