JPS5628392B2 - - Google Patents

Info

Publication number
JPS5628392B2
JPS5628392B2 JP500877A JP500877A JPS5628392B2 JP S5628392 B2 JPS5628392 B2 JP S5628392B2 JP 500877 A JP500877 A JP 500877A JP 500877 A JP500877 A JP 500877A JP S5628392 B2 JPS5628392 B2 JP S5628392B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP500877A
Other languages
Japanese (ja)
Other versions
JPS5390890A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP500877A priority Critical patent/JPS5390890A/ja
Priority to US05/866,959 priority patent/US4163976A/en
Priority to GB880/78A priority patent/GB1593212A/en
Priority to FR7801554A priority patent/FR2378385A1/fr
Priority to DE2802173A priority patent/DE2802173C3/de
Publication of JPS5390890A publication Critical patent/JPS5390890A/ja
Publication of JPS5628392B2 publication Critical patent/JPS5628392B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/124Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers incorporating phase shifts
    • H01S5/1243Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers incorporating phase shifts by other means than a jump in the grating period, e.g. bent waveguides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054Methods of obtaining the confinement
    • H01S5/2059Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223Buried stripe structure
    • H01S5/2231Buried stripe structure with inner confining structure only between the active layer and the upper electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227Buried mesa structure ; Striped active layer
    • H01S5/2275Buried mesa structure ; Striped active layer mesa created by etching

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
JP500877A 1977-01-21 1977-01-21 Semiconductor laser device Granted JPS5390890A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP500877A JPS5390890A (en) 1977-01-21 1977-01-21 Semiconductor laser device
US05/866,959 US4163976A (en) 1977-01-21 1978-01-05 Semiconductor laser device
GB880/78A GB1593212A (en) 1977-01-21 1978-01-10 Semiconductor laser device
FR7801554A FR2378385A1 (fr) 1977-01-21 1978-01-19 Dispositif laser a semi-conducteurs
DE2802173A DE2802173C3 (de) 1977-01-21 1978-01-19 Halbleiterlaseranordnung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP500877A JPS5390890A (en) 1977-01-21 1977-01-21 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS5390890A JPS5390890A (en) 1978-08-10
JPS5628392B2 true JPS5628392B2 (US07642317-20100105-C00010.png) 1981-07-01

Family

ID=11599511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP500877A Granted JPS5390890A (en) 1977-01-21 1977-01-21 Semiconductor laser device

Country Status (5)

Country Link
US (1) US4163976A (US07642317-20100105-C00010.png)
JP (1) JPS5390890A (US07642317-20100105-C00010.png)
DE (1) DE2802173C3 (US07642317-20100105-C00010.png)
FR (1) FR2378385A1 (US07642317-20100105-C00010.png)
GB (1) GB1593212A (US07642317-20100105-C00010.png)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4251780A (en) * 1978-07-03 1981-02-17 Xerox Corporation Stripe offset geometry in injection lasers to achieve transverse mode control
US4464762A (en) * 1982-02-22 1984-08-07 Bell Telephone Laboratories, Incorporated Monolithically integrated distributed Bragg reflector laser
DE3332398A1 (de) * 1983-09-08 1985-03-28 Standard Elektrik Lorenz Ag, 7000 Stuttgart Multimodenlaser
JPS62144378A (ja) * 1985-12-18 1987-06-27 Sony Corp 分布帰還覆半導体レ−ザ−
JP2007251064A (ja) * 2006-03-17 2007-09-27 Toyota Central Res & Dev Lab Inc 半導体レーザー装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4326176A (en) * 1976-04-16 1982-04-20 Hitachi, Ltd. Semiconductor laser device

Also Published As

Publication number Publication date
FR2378385A1 (fr) 1978-08-18
GB1593212A (en) 1981-07-15
US4163976A (en) 1979-08-07
JPS5390890A (en) 1978-08-10
DE2802173C3 (de) 1980-11-13
DE2802173A1 (de) 1978-07-27
DE2802173B2 (de) 1980-03-13
FR2378385B1 (US07642317-20100105-C00010.png) 1981-09-04

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