JPS5624942B2 - - Google Patents
Info
- Publication number
- JPS5624942B2 JPS5624942B2 JP5306776A JP5306776A JPS5624942B2 JP S5624942 B2 JPS5624942 B2 JP S5624942B2 JP 5306776 A JP5306776 A JP 5306776A JP 5306776 A JP5306776 A JP 5306776A JP S5624942 B2 JPS5624942 B2 JP S5624942B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5306776A JPS52136001A (en) | 1976-05-10 | 1976-05-10 | Method of adjusting dimensions of lines on photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5306776A JPS52136001A (en) | 1976-05-10 | 1976-05-10 | Method of adjusting dimensions of lines on photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52136001A JPS52136001A (en) | 1977-11-14 |
JPS5624942B2 true JPS5624942B2 (it) | 1981-06-09 |
Family
ID=12932469
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5306776A Granted JPS52136001A (en) | 1976-05-10 | 1976-05-10 | Method of adjusting dimensions of lines on photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52136001A (it) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5477070A (en) * | 1977-12-01 | 1979-06-20 | Fujitsu Ltd | Production of photo mask |
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1976
- 1976-05-10 JP JP5306776A patent/JPS52136001A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS52136001A (en) | 1977-11-14 |