JPS5622432A - Etching mask holder - Google Patents

Etching mask holder

Info

Publication number
JPS5622432A
JPS5622432A JP9780079A JP9780079A JPS5622432A JP S5622432 A JPS5622432 A JP S5622432A JP 9780079 A JP9780079 A JP 9780079A JP 9780079 A JP9780079 A JP 9780079A JP S5622432 A JPS5622432 A JP S5622432A
Authority
JP
Japan
Prior art keywords
mask
holder
contact area
unevenness
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9780079A
Other languages
Japanese (ja)
Inventor
Kazuo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP9780079A priority Critical patent/JPS5622432A/en
Publication of JPS5622432A publication Critical patent/JPS5622432A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate unevenness in mask processing, by reducing a contact area between a holder and a mask nearly to the necessary minimum for holding the mask. CONSTITUTION:Holes are provided in part 2 contacting to a mask, in bottom 3, and ends 4 in single holder 1 made of polypropylene so as to reduce a contact area nearly to the limit for holding the mask, and in another case, holes are formed in sides 2 and ends 4 of holder 5 made of a fluorocarbon resin already fixed to a mask processing unit so as to reduce a contact area similarily. Use of a holder of such a structure and reduction of a mask contact area permits processing unevenness in developing and etching to be prevented and baking unevenness in a mask baking process also to be inhibited.
JP9780079A 1979-07-31 1979-07-31 Etching mask holder Pending JPS5622432A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9780079A JPS5622432A (en) 1979-07-31 1979-07-31 Etching mask holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9780079A JPS5622432A (en) 1979-07-31 1979-07-31 Etching mask holder

Publications (1)

Publication Number Publication Date
JPS5622432A true JPS5622432A (en) 1981-03-03

Family

ID=14201851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9780079A Pending JPS5622432A (en) 1979-07-31 1979-07-31 Etching mask holder

Country Status (1)

Country Link
JP (1) JPS5622432A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0847777A (en) * 1995-07-31 1996-02-20 Komatsu Ltd Plasma cutting machine

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0847777A (en) * 1995-07-31 1996-02-20 Komatsu Ltd Plasma cutting machine

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