JPS5620539B2 - - Google Patents
Info
- Publication number
- JPS5620539B2 JPS5620539B2 JP6990872A JP6990872A JPS5620539B2 JP S5620539 B2 JPS5620539 B2 JP S5620539B2 JP 6990872 A JP6990872 A JP 6990872A JP 6990872 A JP6990872 A JP 6990872A JP S5620539 B2 JPS5620539 B2 JP S5620539B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6990872A JPS5620539B2 (en:Method) | 1972-07-14 | 1972-07-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6990872A JPS5620539B2 (en:Method) | 1972-07-14 | 1972-07-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4929577A JPS4929577A (en:Method) | 1974-03-16 |
| JPS5620539B2 true JPS5620539B2 (en:Method) | 1981-05-14 |
Family
ID=13416253
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6990872A Expired JPS5620539B2 (en:Method) | 1972-07-14 | 1972-07-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5620539B2 (en:Method) |
-
1972
- 1972-07-14 JP JP6990872A patent/JPS5620539B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4929577A (en:Method) | 1974-03-16 |