JPS561777B2 - - Google Patents
Info
- Publication number
- JPS561777B2 JPS561777B2 JP2338976A JP2338976A JPS561777B2 JP S561777 B2 JPS561777 B2 JP S561777B2 JP 2338976 A JP2338976 A JP 2338976A JP 2338976 A JP2338976 A JP 2338976A JP S561777 B2 JPS561777 B2 JP S561777B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/40—Optical focusing aids
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
- Polarising Elements (AREA)
- Control Of Position Or Direction (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/556,224 US3990798A (en) | 1975-03-07 | 1975-03-07 | Method and apparatus for aligning mask and wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51112282A JPS51112282A (en) | 1976-10-04 |
| JPS561777B2 true JPS561777B2 (US07923587-20110412-C00022.png) | 1981-01-16 |
Family
ID=24220406
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP51023389A Granted JPS51112282A (en) | 1975-03-07 | 1976-03-05 | Method of aligning miniature mask pattern with miniature semiconductor pattern |
Country Status (11)
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2722397C2 (de) * | 1977-05-17 | 1983-06-23 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Justierung einer Halbleiterscheibe relativ zu einer Belichtungsmaske bei der Röntgenstrahl- Fotolithografie und eine Vorrichtung zur Durchführung dieses Verfahrens |
| JPS5512271U (US07923587-20110412-C00022.png) * | 1978-07-12 | 1980-01-25 | ||
| US4356223A (en) * | 1980-02-28 | 1982-10-26 | Nippon Electric Co., Ltd. | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working |
| JPS56136244U (US07923587-20110412-C00022.png) * | 1980-03-15 | 1981-10-15 | ||
| US4398824A (en) * | 1981-04-15 | 1983-08-16 | Bell Telephone Laboratories, Incorporated | Wafer tilt compensation in zone plate alignment system |
| US4595295A (en) * | 1982-01-06 | 1986-06-17 | International Business Machines Corporation | Alignment system for lithographic proximity printing |
| JPS5936220A (ja) * | 1982-08-25 | 1984-02-28 | Toshiba Corp | 固定スリット型光電顕微鏡 |
| JPS5942517A (ja) * | 1982-09-02 | 1984-03-09 | Nippon Kogaku Kk <Nikon> | 二重焦点光学系 |
| US4636626A (en) * | 1983-01-14 | 1987-01-13 | Nippon Kogaku K.K. | Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication |
| JPS60183508A (ja) * | 1984-03-02 | 1985-09-19 | Nippon Kogaku Kk <Nikon> | 微小間隔検出装置 |
| US4623257A (en) * | 1984-12-28 | 1986-11-18 | At&T Bell Laboratories | Alignment marks for fine-line device fabrication |
| JPS6441805A (en) * | 1987-08-07 | 1989-02-14 | Sumitomo Heavy Industries | Position detecting apparatus of two bodies, which are separated by minute distance |
| US4981342A (en) * | 1987-09-24 | 1991-01-01 | Allergan Inc. | Multifocal birefringent lens system |
| US4941255A (en) * | 1989-11-15 | 1990-07-17 | Eastman Kodak Company | Method for precision multichip assembly |
| JP3534363B2 (ja) * | 1995-07-31 | 2004-06-07 | パイオニア株式会社 | 結晶レンズ及びこれを用いた光ピックアップ光学系 |
| KR100269244B1 (ko) * | 1998-05-28 | 2000-12-01 | 정선종 | 복굴절 물질로 만들어진 투과형 광학부품을 사용한 리소그래피장비용 광학계의 초점심도 확장 방법 및 장치 |
| JP4671082B2 (ja) * | 2000-10-15 | 2011-04-13 | 明 石井 | 定倍率可変焦点結像方法および装置 |
| EP2016456A4 (en) * | 2006-04-20 | 2010-08-25 | Xceed Imaging Ltd | THROUGH OPTICAL SYSTEM AND METHOD FOR PROVIDING AN ENLARGED SHARPNESS DURING THE FIGURE |
| US8248605B2 (en) * | 2006-09-26 | 2012-08-21 | Hinds Instruments, Inc. | Detection system for birefringence measurement |
| US9228936B2 (en) | 2013-12-03 | 2016-01-05 | Hinds Instruments, Inc. | Birefringence measurement of polycrystalline silicon samples or the like |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2601175A (en) * | 1947-08-05 | 1952-06-17 | Smith Francis Hughes | Interference microscope |
| US3488104A (en) * | 1966-09-12 | 1970-01-06 | Fairchild Camera Instr Co | Dual focal plane microscope |
| US3520592A (en) * | 1967-09-14 | 1970-07-14 | Grumman Corp | Optical focusing system utilizing birefringent lenses |
| GB1248771A (en) * | 1968-08-02 | 1971-10-06 | Vickers Ltd | Double-refracting interference microscope |
| JPS5117297B1 (US07923587-20110412-C00022.png) * | 1971-03-11 | 1976-06-01 |
-
1975
- 1975-03-07 US US05/556,224 patent/US3990798A/en not_active Expired - Lifetime
-
1976
- 1976-02-20 CA CA246,191A patent/CA1046823A/en not_active Expired
- 1976-02-25 GB GB7528/76A patent/GB1543208A/en not_active Expired
- 1976-02-25 SE SE7602373A patent/SE416590B/xx not_active IP Right Cessation
- 1976-03-02 BE BE164779A patent/BE839099A/xx not_active IP Right Cessation
- 1976-03-02 DE DE2608483A patent/DE2608483B2/de not_active Ceased
- 1976-03-04 FR FR7606150A patent/FR2303315A1/fr active Granted
- 1976-03-05 JP JP51023389A patent/JPS51112282A/ja active Granted
- 1976-03-05 ES ES445804A patent/ES445804A1/es not_active Expired
- 1976-03-05 NL NL7602349A patent/NL7602349A/xx not_active Application Discontinuation
- 1976-03-05 IT IT20917/76A patent/IT1063931B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| NL7602349A (nl) | 1976-09-09 |
| DE2608483A1 (de) | 1976-09-16 |
| IT1063931B (it) | 1985-02-18 |
| US3990798A (en) | 1976-11-09 |
| FR2303315B1 (US07923587-20110412-C00022.png) | 1980-01-04 |
| SE7602373L (sv) | 1976-09-08 |
| CA1046823A (en) | 1979-01-23 |
| ES445804A1 (es) | 1977-06-01 |
| GB1543208A (en) | 1979-03-28 |
| DE2608483B2 (de) | 1980-08-28 |
| JPS51112282A (en) | 1976-10-04 |
| FR2303315A1 (fr) | 1976-10-01 |
| SE416590B (sv) | 1981-01-19 |
| BE839099A (fr) | 1976-07-01 |
