JPS5615569B2 - - Google Patents
Info
- Publication number
- JPS5615569B2 JPS5615569B2 JP258677A JP258677A JPS5615569B2 JP S5615569 B2 JPS5615569 B2 JP S5615569B2 JP 258677 A JP258677 A JP 258677A JP 258677 A JP258677 A JP 258677A JP S5615569 B2 JPS5615569 B2 JP S5615569B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP258677A JPS5387668A (en) | 1977-01-13 | 1977-01-13 | Forming method of patterns |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP258677A JPS5387668A (en) | 1977-01-13 | 1977-01-13 | Forming method of patterns |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5387668A JPS5387668A (en) | 1978-08-02 |
| JPS5615569B2 true JPS5615569B2 (enExample) | 1981-04-10 |
Family
ID=11533469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP258677A Granted JPS5387668A (en) | 1977-01-13 | 1977-01-13 | Forming method of patterns |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5387668A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62178448U (enExample) * | 1986-05-06 | 1987-11-12 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1155238A (en) * | 1979-11-27 | 1983-10-11 | Richard E. Howard | High resolution two-layer resists |
| JPS58218119A (ja) * | 1982-06-14 | 1983-12-19 | Hitachi Ltd | パタ−ン形成方法 |
| JPH02225214A (ja) * | 1989-02-28 | 1990-09-07 | Tokyo Electron Ltd | ロード・アンロード装置 |
-
1977
- 1977-01-13 JP JP258677A patent/JPS5387668A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62178448U (enExample) * | 1986-05-06 | 1987-11-12 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5387668A (en) | 1978-08-02 |