JPS56150818A - Washing of semiconductor device - Google Patents

Washing of semiconductor device

Info

Publication number
JPS56150818A
JPS56150818A JP5291280A JP5291280A JPS56150818A JP S56150818 A JPS56150818 A JP S56150818A JP 5291280 A JP5291280 A JP 5291280A JP 5291280 A JP5291280 A JP 5291280A JP S56150818 A JPS56150818 A JP S56150818A
Authority
JP
Japan
Prior art keywords
semiconductor device
dissolved
washing
water
washed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5291280A
Other languages
Japanese (ja)
Other versions
JPS5856253B2 (en
Inventor
Norio Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP5291280A priority Critical patent/JPS5856253B2/en
Publication of JPS56150818A publication Critical patent/JPS56150818A/en
Publication of JPS5856253B2 publication Critical patent/JPS5856253B2/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)

Abstract

PURPOSE:To contrive to improve the characteristic of the semiconductor device by a method wherein a demineralized water being specified free chlorine dissolved therein a used as a cleaning water, and washing is performed. CONSTITUTION:When the semiconductor device is to be washed, the device is washed with the demineralized water being free chlorine less than 0.1ppm dissolved therein. Accordingly the growth of bacteria in the cleaning water is suppressed, and even if heavy metal is adhered to the water, it is combined favorably with the dissolved chlorine and is removed, and the characteristic of the semiconductor device can be improved much more.
JP5291280A 1980-04-23 1980-04-23 How to clean semiconductor devices Expired JPS5856253B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5291280A JPS5856253B2 (en) 1980-04-23 1980-04-23 How to clean semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5291280A JPS5856253B2 (en) 1980-04-23 1980-04-23 How to clean semiconductor devices

Publications (2)

Publication Number Publication Date
JPS56150818A true JPS56150818A (en) 1981-11-21
JPS5856253B2 JPS5856253B2 (en) 1983-12-14

Family

ID=12928037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5291280A Expired JPS5856253B2 (en) 1980-04-23 1980-04-23 How to clean semiconductor devices

Country Status (1)

Country Link
JP (1) JPS5856253B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0702399A1 (en) * 1994-09-14 1996-03-20 Siemens Aktiengesellschaft Process for wet chemical removal of contaminants from semiconductor crystal surfaces
US6116254A (en) * 1995-03-30 2000-09-12 Nec Corporation Cleaning method and system of semiconductor substrate and production method of cleaning solution

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0702399A1 (en) * 1994-09-14 1996-03-20 Siemens Aktiengesellschaft Process for wet chemical removal of contaminants from semiconductor crystal surfaces
US6116254A (en) * 1995-03-30 2000-09-12 Nec Corporation Cleaning method and system of semiconductor substrate and production method of cleaning solution
CN1080454C (en) * 1995-03-30 2002-03-06 日本电气株式会社 Cleaning method and system of semiconductor substrate and production method of cleaning liquid

Also Published As

Publication number Publication date
JPS5856253B2 (en) 1983-12-14

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