JPS56149402A - Photopolymerizable composition and polymerization thereof - Google Patents

Photopolymerizable composition and polymerization thereof

Info

Publication number
JPS56149402A
JPS56149402A JP3306081A JP3306081A JPS56149402A JP S56149402 A JPS56149402 A JP S56149402A JP 3306081 A JP3306081 A JP 3306081A JP 3306081 A JP3306081 A JP 3306081A JP S56149402 A JPS56149402 A JP S56149402A
Authority
JP
Japan
Prior art keywords
polymerization
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3306081A
Other languages
Japanese (ja)
Other versions
JPH0245641B2 (en
Inventor
Edowaado Guriin Jiyooji
Aabuingu Edowaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS56149402A publication Critical patent/JPS56149402A/en
Publication of JPH0245641B2 publication Critical patent/JPH0245641B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Reinforced Plastic Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
JP3306081A 1980-03-07 1981-03-07 HIKARIJUGOSEISOSEIBUTSUOYOBISONOJUGOHO Expired - Lifetime JPH0245641B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8007893 1980-03-07

Publications (2)

Publication Number Publication Date
JPS56149402A true JPS56149402A (en) 1981-11-19
JPH0245641B2 JPH0245641B2 (en) 1990-10-11

Family

ID=10511952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3306081A Expired - Lifetime JPH0245641B2 (en) 1980-03-07 1981-03-07 HIKARIJUGOSEISOSEIBUTSUOYOBISONOJUGOHO

Country Status (1)

Country Link
JP (1) JPH0245641B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03188102A (en) * 1989-12-15 1991-08-16 Nippon Kasei Kk Polymerizable curable composition
JPH0470833A (en) * 1990-07-12 1992-03-05 Mitsubishi Kasei Corp Negative type photosensitive composition
US5981616A (en) * 1996-12-13 1999-11-09 Dsm N.V. Photo-curable resin composition used for photo fabication of three-dimensional objects
US6013714A (en) * 1996-09-20 2000-01-11 Dsm N.V. Resin composition and fibrous material forming mold
US6096796A (en) * 1996-12-10 2000-08-01 Dsm N.V. Photo-curable resin composition
US6127085A (en) * 1996-10-14 2000-10-03 Dsm N.V. Photo-curable resin composition
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
JPWO2014092019A1 (en) * 2012-12-12 2017-01-12 株式会社ニコン Composition, laminate, method for producing laminate, transistor and method for producing transistor

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03188102A (en) * 1989-12-15 1991-08-16 Nippon Kasei Kk Polymerizable curable composition
JPH0470833A (en) * 1990-07-12 1992-03-05 Mitsubishi Kasei Corp Negative type photosensitive composition
US6013714A (en) * 1996-09-20 2000-01-11 Dsm N.V. Resin composition and fibrous material forming mold
US6127085A (en) * 1996-10-14 2000-10-03 Dsm N.V. Photo-curable resin composition
US6096796A (en) * 1996-12-10 2000-08-01 Dsm N.V. Photo-curable resin composition
US6365644B1 (en) 1996-12-13 2002-04-02 Dsm N.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
US5981616A (en) * 1996-12-13 1999-11-09 Dsm N.V. Photo-curable resin composition used for photo fabication of three-dimensional objects
USRE42593E1 (en) 1996-12-13 2011-08-02 Dsm Ip Assets B.V. Photo-curable resin composition used for photo-fabrication of three-dimensional object
US6805439B2 (en) 2001-09-06 2004-10-19 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
US6866376B2 (en) 2001-09-28 2005-03-15 Brother Kogyo Kabushiki Kaisha Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink
EP1983023A1 (en) 2007-02-02 2008-10-22 JSR Corporation Radiation-curable composition, composite and manufacturing method thereof
EP2402818A1 (en) 2010-06-30 2012-01-04 FUJIFILM Corporation Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same
JPWO2014092019A1 (en) * 2012-12-12 2017-01-12 株式会社ニコン Composition, laminate, method for producing laminate, transistor and method for producing transistor
US10074803B2 (en) 2012-12-12 2018-09-11 Nikon Corporation Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor
US10476005B2 (en) 2012-12-12 2019-11-12 Nikon Corporation Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor

Also Published As

Publication number Publication date
JPH0245641B2 (en) 1990-10-11

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