JPS56149402A - Photopolymerizable composition and polymerization thereof - Google Patents
Photopolymerizable composition and polymerization thereofInfo
- Publication number
- JPS56149402A JPS56149402A JP3306081A JP3306081A JPS56149402A JP S56149402 A JPS56149402 A JP S56149402A JP 3306081 A JP3306081 A JP 3306081A JP 3306081 A JP3306081 A JP 3306081A JP S56149402 A JPS56149402 A JP S56149402A
- Authority
- JP
- Japan
- Prior art keywords
- polymerization
- photopolymerizable composition
- photopolymerizable
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Reinforced Plastic Materials (AREA)
- Polymerisation Methods In General (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8007893 | 1980-03-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56149402A true JPS56149402A (en) | 1981-11-19 |
JPH0245641B2 JPH0245641B2 (en) | 1990-10-11 |
Family
ID=10511952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3306081A Expired - Lifetime JPH0245641B2 (en) | 1980-03-07 | 1981-03-07 | HIKARIJUGOSEISOSEIBUTSUOYOBISONOJUGOHO |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0245641B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03188102A (en) * | 1989-12-15 | 1991-08-16 | Nippon Kasei Kk | Polymerizable curable composition |
JPH0470833A (en) * | 1990-07-12 | 1992-03-05 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
JPWO2014092019A1 (en) * | 2012-12-12 | 2017-01-12 | 株式会社ニコン | Composition, laminate, method for producing laminate, transistor and method for producing transistor |
-
1981
- 1981-03-07 JP JP3306081A patent/JPH0245641B2/en not_active Expired - Lifetime
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03188102A (en) * | 1989-12-15 | 1991-08-16 | Nippon Kasei Kk | Polymerizable curable composition |
JPH0470833A (en) * | 1990-07-12 | 1992-03-05 | Mitsubishi Kasei Corp | Negative type photosensitive composition |
US6013714A (en) * | 1996-09-20 | 2000-01-11 | Dsm N.V. | Resin composition and fibrous material forming mold |
US6127085A (en) * | 1996-10-14 | 2000-10-03 | Dsm N.V. | Photo-curable resin composition |
US6096796A (en) * | 1996-12-10 | 2000-08-01 | Dsm N.V. | Photo-curable resin composition |
US6365644B1 (en) | 1996-12-13 | 2002-04-02 | Dsm N.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
US5981616A (en) * | 1996-12-13 | 1999-11-09 | Dsm N.V. | Photo-curable resin composition used for photo fabication of three-dimensional objects |
USRE42593E1 (en) | 1996-12-13 | 2011-08-02 | Dsm Ip Assets B.V. | Photo-curable resin composition used for photo-fabrication of three-dimensional object |
US6805439B2 (en) | 2001-09-06 | 2004-10-19 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
US6866376B2 (en) | 2001-09-28 | 2005-03-15 | Brother Kogyo Kabushiki Kaisha | Active energy beam-curable composition, ink containing the same, and printer accommodating the same ink |
EP1983023A1 (en) | 2007-02-02 | 2008-10-22 | JSR Corporation | Radiation-curable composition, composite and manufacturing method thereof |
EP2402818A1 (en) | 2010-06-30 | 2012-01-04 | FUJIFILM Corporation | Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
JPWO2014092019A1 (en) * | 2012-12-12 | 2017-01-12 | 株式会社ニコン | Composition, laminate, method for producing laminate, transistor and method for producing transistor |
US10074803B2 (en) | 2012-12-12 | 2018-09-11 | Nikon Corporation | Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor |
US10476005B2 (en) | 2012-12-12 | 2019-11-12 | Nikon Corporation | Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor |
Also Published As
Publication number | Publication date |
---|---|
JPH0245641B2 (en) | 1990-10-11 |
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