JPS561133B2 - - Google Patents
Info
- Publication number
- JPS561133B2 JPS561133B2 JP15394475A JP15394475A JPS561133B2 JP S561133 B2 JPS561133 B2 JP S561133B2 JP 15394475 A JP15394475 A JP 15394475A JP 15394475 A JP15394475 A JP 15394475A JP S561133 B2 JPS561133 B2 JP S561133B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
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- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15394475A JPS5278176A (en) | 1975-12-25 | 1975-12-25 | Discharge reactor for gases |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15394475A JPS5278176A (en) | 1975-12-25 | 1975-12-25 | Discharge reactor for gases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5278176A JPS5278176A (en) | 1977-07-01 |
| JPS561133B2 true JPS561133B2 (en) | 1981-01-12 |
Family
ID=15573479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15394475A Granted JPS5278176A (en) | 1975-12-25 | 1975-12-25 | Discharge reactor for gases |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5278176A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4735633A (en) | 1987-06-23 | 1988-04-05 | Chiu Kin Chung R | Method and system for vapor extraction from gases |
| US6187072B1 (en) | 1995-09-25 | 2001-02-13 | Applied Materials, Inc. | Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions |
| US6045618A (en) * | 1995-09-25 | 2000-04-04 | Applied Materials, Inc. | Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| US6194628B1 (en) | 1995-09-25 | 2001-02-27 | Applied Materials, Inc. | Method and apparatus for cleaning a vacuum line in a CVD system |
| US6193802B1 (en) | 1995-09-25 | 2001-02-27 | Applied Materials, Inc. | Parallel plate apparatus for in-situ vacuum line cleaning for substrate processing equipment |
| US6354241B1 (en) | 1999-07-15 | 2002-03-12 | Applied Materials, Inc. | Heated electrostatic particle trap for in-situ vacuum line cleaning of a substrated processing |
| US6255222B1 (en) | 1999-08-24 | 2001-07-03 | Applied Materials, Inc. | Method for removing residue from substrate processing chamber exhaust line for silicon-oxygen-carbon deposition process |
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1975
- 1975-12-25 JP JP15394475A patent/JPS5278176A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5278176A (en) | 1977-07-01 |