JPS5610239A - Electron beam macroanalyzer - Google Patents

Electron beam macroanalyzer

Info

Publication number
JPS5610239A
JPS5610239A JP8624679A JP8624679A JPS5610239A JP S5610239 A JPS5610239 A JP S5610239A JP 8624679 A JP8624679 A JP 8624679A JP 8624679 A JP8624679 A JP 8624679A JP S5610239 A JPS5610239 A JP S5610239A
Authority
JP
Japan
Prior art keywords
point
spectroscope
rays
sample
slab sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8624679A
Other languages
Japanese (ja)
Inventor
Hiroshi Soga
Koichi Kitamura
Mitsuyoshi Sato
Hiroshi Ishijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Nippon Steel Corp
Original Assignee
Seiko Instruments Inc
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc, Nippon Steel Corp filed Critical Seiko Instruments Inc
Priority to JP8624679A priority Critical patent/JPS5610239A/en
Publication of JPS5610239A publication Critical patent/JPS5610239A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To improve measuring precision by a system wherein a sample surface height detector is provided, and a spectroscope is moved according to its output. CONSTITUTION:A pair of ionnization boxes 14, 15 are arranged symmetrically on both sides of first collimator 7, and a constitution is such that fluorescent X-rays are incident uniformly so long as a point Q arising on the top of a slab sample 2 whereat an electron beam is applied is positioned on an extension of an optical axis of a spectroscope 16. Where the slab sample 2 is conveyed in the direction 3 indicated by arrow and the sample surface height right beneath an electron gun 4 fluctuates vertically in accordance with the flatness of the upper surface of the slab sample 2, the point Q is shaded by each edge at the lower end of the first collimator 7, there arises a difference in the quantity of X-rays incident between both the ionization boxes 14, 15, a servomotor 11 is driven through a motor driving circuit 12 for correction of said difference, and the spectroscope 16 is turned with a point P as a supporting point. Therefore, fluorescent X-rays are led into a detector 10 at a uniform ratio regardless of the flatness of the slab sample surface.
JP8624679A 1979-07-06 1979-07-06 Electron beam macroanalyzer Pending JPS5610239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8624679A JPS5610239A (en) 1979-07-06 1979-07-06 Electron beam macroanalyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8624679A JPS5610239A (en) 1979-07-06 1979-07-06 Electron beam macroanalyzer

Publications (1)

Publication Number Publication Date
JPS5610239A true JPS5610239A (en) 1981-02-02

Family

ID=13881449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8624679A Pending JPS5610239A (en) 1979-07-06 1979-07-06 Electron beam macroanalyzer

Country Status (1)

Country Link
JP (1) JPS5610239A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58192693A (en) * 1982-05-07 1983-11-10 Ishikawajima Harima Heavy Ind Co Ltd Shape of butt welding groove of pipes
JPH06199292A (en) * 1992-06-30 1994-07-19 Kawasaki Heavy Ind Ltd Multi-axis side stick controller for aircraft
KR101387844B1 (en) * 2008-02-22 2014-04-22 에스아이아이 나노 테크놀로지 가부시키가이샤 X-ray analyzing apparatus and x-ray analyzing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58192693A (en) * 1982-05-07 1983-11-10 Ishikawajima Harima Heavy Ind Co Ltd Shape of butt welding groove of pipes
JPH0223278B2 (en) * 1982-05-07 1990-05-23 Ishikawajima Harima Heavy Ind
JPH06199292A (en) * 1992-06-30 1994-07-19 Kawasaki Heavy Ind Ltd Multi-axis side stick controller for aircraft
KR101387844B1 (en) * 2008-02-22 2014-04-22 에스아이아이 나노 테크놀로지 가부시키가이샤 X-ray analyzing apparatus and x-ray analyzing method

Similar Documents

Publication Publication Date Title
JPS5616802A (en) Method and unit for measuring electro-optically dimension,position and form of object
CA1032381A (en) Opto-electronic system for determining a deviation between the actual and the desired position of a plane in an optical imaging system
AU598007B2 (en) Improvements relating to spectrometers
DE3274497D1 (en) Opposing field spectrometer for electron beam measuring
ATE107782T1 (en) OPTICAL POSITIONING SYSTEM FOR AT LEAST ONE IMAGE POINT.
GB2079486B (en) Optical spectroscope for scanning electron microscope
JPS5610239A (en) Electron beam macroanalyzer
BE868122A (en) PROCESS FOR MANUFACTURING SYRUPS WITH A HIGH FRUCTOSE CONTENT FROM SACCHAROSE
JPS5610240A (en) Electron beam macroanalyzer
ATE136400T1 (en) BEAM CLARIFIER WITH HIGH PRECISION
JPS56126927A (en) Exposure method by electron beam
JPS5717913A (en) Manufacture of substrate for optical fiber fixation
JPS5616852A (en) Electron beam macroanalyzer
JPS5359486A (en) Reflection type electron-diffraction method
JPS57115925A (en) Centering device
DE3174247D1 (en) Method to detect optically and/or to measure a deformation and/or a displacement of an object or part of an object, device to carry out the method and use of the method
JPS56147347A (en) Electrode structure
JPS5544981A (en) Radiation thermometer for wire
JPS5636058A (en) Measuring system for surface electric potential
JPS5640244A (en) Beam scanning correction at electron beam exposure
JPS5538057A (en) Electron beam device
JPS5240163A (en) Measurement method
JPH0452695Y2 (en)
JPS6468608A (en) Surface waviness measuring instrument
JPS5748230A (en) Electron ray exposure