JPS5596164U - - Google Patents
Info
- Publication number
- JPS5596164U JPS5596164U JP13591779U JP13591779U JPS5596164U JP S5596164 U JPS5596164 U JP S5596164U JP 13591779 U JP13591779 U JP 13591779U JP 13591779 U JP13591779 U JP 13591779U JP S5596164 U JPS5596164 U JP S5596164U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13591779U JPS5596164U (ja) | 1979-10-01 | 1979-10-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13591779U JPS5596164U (ja) | 1979-10-01 | 1979-10-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5596164U true JPS5596164U (ja) | 1980-07-03 |
Family
ID=29106676
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13591779U Pending JPS5596164U (ja) | 1979-10-01 | 1979-10-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5596164U (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007531239A (ja) * | 2004-04-02 | 2007-11-01 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | イオン注入に基づくプラズマのファラデードーズ及び均一性監視背景技術 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4926184A (ja) * | 1971-09-07 | 1974-03-08 |
-
1979
- 1979-10-01 JP JP13591779U patent/JPS5596164U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4926184A (ja) * | 1971-09-07 | 1974-03-08 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007531239A (ja) * | 2004-04-02 | 2007-11-01 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | イオン注入に基づくプラズマのファラデードーズ及び均一性監視背景技術 |