JPS5596164A - Sexual organ washing tool directly coupled with waterwork type shower port - Google Patents
Sexual organ washing tool directly coupled with waterwork type shower portInfo
- Publication number
- JPS5596164A JPS5596164A JP379079A JP379079A JPS5596164A JP S5596164 A JPS5596164 A JP S5596164A JP 379079 A JP379079 A JP 379079A JP 379079 A JP379079 A JP 379079A JP S5596164 A JPS5596164 A JP S5596164A
- Authority
- JP
- Japan
- Prior art keywords
- waterwork
- directly coupled
- type shower
- washing tool
- sexual organ
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP379079A JPS5596164A (en) | 1979-01-16 | 1979-01-16 | Sexual organ washing tool directly coupled with waterwork type shower port |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP379079A JPS5596164A (en) | 1979-01-16 | 1979-01-16 | Sexual organ washing tool directly coupled with waterwork type shower port |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5596164A true JPS5596164A (en) | 1980-07-22 |
Family
ID=11566976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP379079A Pending JPS5596164A (en) | 1979-01-16 | 1979-01-16 | Sexual organ washing tool directly coupled with waterwork type shower port |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5596164A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6368877U (en) * | 1986-10-23 | 1988-05-09 | ||
JP4928439B2 (en) * | 2004-04-02 | 2012-05-09 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | Faraday dose and uniformity monitoring background technology of plasma based on ion implantation |
-
1979
- 1979-01-16 JP JP379079A patent/JPS5596164A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6368877U (en) * | 1986-10-23 | 1988-05-09 | ||
JPH0421357Y2 (en) * | 1986-10-23 | 1992-05-15 | ||
JP4928439B2 (en) * | 2004-04-02 | 2012-05-09 | バリアン・セミコンダクター・イクイップメント・アソシエーツ・インコーポレーテッド | Faraday dose and uniformity monitoring background technology of plasma based on ion implantation |
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