JPS55904B1 - - Google Patents
Info
- Publication number
- JPS55904B1 JPS55904B1 JP1685770A JP1685770A JPS55904B1 JP S55904 B1 JPS55904 B1 JP S55904B1 JP 1685770 A JP1685770 A JP 1685770A JP 1685770 A JP1685770 A JP 1685770A JP S55904 B1 JPS55904 B1 JP S55904B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1685770A JPS55904B1 (en) | 1970-02-27 | 1970-02-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1685770A JPS55904B1 (en) | 1970-02-27 | 1970-02-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55904B1 true JPS55904B1 (en) | 1980-01-10 |
Family
ID=11927874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1685770A Pending JPS55904B1 (en) | 1970-02-27 | 1970-02-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55904B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10969677B2 (en) * | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |
-
1970
- 1970-02-27 JP JP1685770A patent/JPS55904B1/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10969677B2 (en) * | 2016-01-27 | 2021-04-06 | Lg Chem, Ltd. | Film mask, method for manufacturing same, and method for forming pattern using film mask |