JPS5590262A - Method of manufacturing polisher - Google Patents
Method of manufacturing polisherInfo
- Publication number
- JPS5590262A JPS5590262A JP15917178A JP15917178A JPS5590262A JP S5590262 A JPS5590262 A JP S5590262A JP 15917178 A JP15917178 A JP 15917178A JP 15917178 A JP15917178 A JP 15917178A JP S5590262 A JPS5590262 A JP S5590262A
- Authority
- JP
- Japan
- Prior art keywords
- polisher
- resin
- projections
- recesses
- synthetic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To cheaply and efficiently manufacture a heavy polisher of uniform surface construction, by setting a thermoplastic synthetic resin for the polisher between dies and heating and shaping the resin to provide recesses and projections. CONSTITUTION:A load is applied to a thermoplastic synthetic resin 1 and a pattern mask 3 by the thrusting action of press boards 4 for a prescribed time. The resin and the mask are then cooled in air and in a liquid. As a result, recesses and projections in a shape corresponding to that of recesses and projections 2 of the pattern mask 3 are provided on the surface of the synthetic resin 1. The shaped resin 1 is picked out. A heavy polisher is thus obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15917178A JPS5590262A (en) | 1978-12-26 | 1978-12-26 | Method of manufacturing polisher |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15917178A JPS5590262A (en) | 1978-12-26 | 1978-12-26 | Method of manufacturing polisher |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5590262A true JPS5590262A (en) | 1980-07-08 |
Family
ID=15687828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15917178A Pending JPS5590262A (en) | 1978-12-26 | 1978-12-26 | Method of manufacturing polisher |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5590262A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5978054U (en) * | 1982-11-18 | 1984-05-26 | アルプス電気株式会社 | polishing equipment |
JPS61199354U (en) * | 1985-05-30 | 1986-12-13 | ||
WO2006020153A3 (en) * | 2004-07-21 | 2006-04-27 | Neopad Technologies Corp | Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs |
-
1978
- 1978-12-26 JP JP15917178A patent/JPS5590262A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5978054U (en) * | 1982-11-18 | 1984-05-26 | アルプス電気株式会社 | polishing equipment |
JPS6212536Y2 (en) * | 1982-11-18 | 1987-04-01 | ||
JPS61199354U (en) * | 1985-05-30 | 1986-12-13 | ||
WO2006020153A3 (en) * | 2004-07-21 | 2006-04-27 | Neopad Technologies Corp | Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs |
US7377840B2 (en) | 2004-07-21 | 2008-05-27 | Neopad Technologies Corporation | Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs |
US8287793B2 (en) | 2004-07-21 | 2012-10-16 | Nexplanar Corporation | Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs |
US8932116B2 (en) | 2004-07-21 | 2015-01-13 | Nexplanar Corporation | Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs |
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