JPS5584917A - Pretreating substrate surface for liquid crystal display cell - Google Patents

Pretreating substrate surface for liquid crystal display cell

Info

Publication number
JPS5584917A
JPS5584917A JP15823579A JP15823579A JPS5584917A JP S5584917 A JPS5584917 A JP S5584917A JP 15823579 A JP15823579 A JP 15823579A JP 15823579 A JP15823579 A JP 15823579A JP S5584917 A JPS5584917 A JP S5584917A
Authority
JP
Japan
Prior art keywords
liquid crystal
crystal display
substrate surface
display cell
pretreating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15823579A
Other languages
English (en)
Other versions
JPS647644B2 (ja
Inventor
Jiyon Supurotsukeru Jieraado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5584917A publication Critical patent/JPS5584917A/ja
Publication of JPS647644B2 publication Critical patent/JPS647644B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Physical Vapour Deposition (AREA)
JP15823579A 1978-12-18 1979-12-07 Pretreating substrate surface for liquid crystal display cell Granted JPS5584917A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/970,496 US4261650A (en) 1978-12-18 1978-12-18 Method for producing uniform parallel alignment in liquid crystal cells

Publications (2)

Publication Number Publication Date
JPS5584917A true JPS5584917A (en) 1980-06-26
JPS647644B2 JPS647644B2 (ja) 1989-02-09

Family

ID=25517034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15823579A Granted JPS5584917A (en) 1978-12-18 1979-12-07 Pretreating substrate surface for liquid crystal display cell

Country Status (5)

Country Link
US (1) US4261650A (ja)
EP (1) EP0012440B1 (ja)
JP (1) JPS5584917A (ja)
CA (1) CA1120887A (ja)
DE (1) DE2964658D1 (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3001125A1 (de) * 1980-01-14 1981-07-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung einer fluessigkristallanzeige
US4329418A (en) * 1980-11-14 1982-05-11 Lord Corporation Organometallic semiconductor devices
US4386117A (en) * 1981-11-20 1983-05-31 Gordon Roy G Coating process using alkoxy substituted silicon-bearing reactant
US4585310A (en) * 1983-12-12 1986-04-29 International Business Machines Corporation Alignment layer orientation in raster scan thermally addressed smectic liquid crystal displays
GB2177227B (en) * 1985-06-14 1989-12-28 Semiconductor Energy Lab Optical non-volatile liquid crystal memory
US4820026A (en) * 1986-03-20 1989-04-11 Canon Kabushiki Kaisha Ferroelectric liquid crystal device with modified polyvinyl alcohol alignment film
EP0275140B1 (en) * 1987-01-09 1995-07-19 Hitachi, Ltd. Method and circuit for scanning capacitive loads
JPH0453946U (ja) * 1990-09-12 1992-05-08
EP0969120B1 (en) * 1991-05-10 2003-07-30 Celestech, Inc. Method for plasma deposition
US5204144A (en) * 1991-05-10 1993-04-20 Celestech, Inc. Method for plasma deposition on apertured substrates
CA2123658C (en) * 1993-05-19 1999-01-19 Willis H. Smith, Jr. Inducing tilted parallel alignment in liquid crystals
FR2712309B1 (fr) * 1993-11-10 1995-12-22 Yannick Chouan Procédé de dépôt de couches minces de silice à basse température et machine de dépôt pour la mise en Óoeuvre de ce procédé.
US5378494A (en) * 1994-02-18 1995-01-03 Minnesota Mining And Manufacturing Company Method of applying a thin coating on the lower surface of a bilevel substrate
US6406760B1 (en) 1996-06-10 2002-06-18 Celestech, Inc. Diamond film deposition on substrate arrays
US6173672B1 (en) 1997-06-06 2001-01-16 Celestech, Inc. Diamond film deposition on substrate arrays
US6632483B1 (en) * 2000-06-30 2003-10-14 International Business Machines Corporation Ion gun deposition and alignment for liquid-crystal applications
EP1664914A1 (en) * 2003-05-19 2006-06-07 Kent State University Method of plasma beam bombardment of aligning films for liquid crystals
EP2245505A1 (en) 2008-02-29 2010-11-03 Merck Patent GmbH Alignment film for liquid crystals obtainable by direct particle beam deposition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503358A (ja) * 1973-05-11 1975-01-14
JPS51129251A (en) * 1975-04-21 1976-11-10 Hughes Aircraft Co Method of inducing uniform parallel array of liquid crystal substance in liquid crystal cell

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3834792A (en) * 1972-04-10 1974-09-10 Ncr Alignment film for a liquid crystal display cell
US4084884A (en) * 1974-02-21 1978-04-18 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Liquid crystal devices
US4038439A (en) * 1976-09-20 1977-07-26 International Business Machines Corporation Method for producing selected alignment in liquid crystal

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503358A (ja) * 1973-05-11 1975-01-14
JPS51129251A (en) * 1975-04-21 1976-11-10 Hughes Aircraft Co Method of inducing uniform parallel array of liquid crystal substance in liquid crystal cell

Also Published As

Publication number Publication date
EP0012440B1 (en) 1983-01-26
US4261650A (en) 1981-04-14
DE2964658D1 (en) 1983-03-03
EP0012440A1 (en) 1980-06-25
CA1120887A (en) 1982-03-30
JPS647644B2 (ja) 1989-02-09

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