JPS557689B2 - - Google Patents

Info

Publication number
JPS557689B2
JPS557689B2 JP6419875A JP6419875A JPS557689B2 JP S557689 B2 JPS557689 B2 JP S557689B2 JP 6419875 A JP6419875 A JP 6419875A JP 6419875 A JP6419875 A JP 6419875A JP S557689 B2 JPS557689 B2 JP S557689B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6419875A
Other languages
Japanese (ja)
Other versions
JPS51140473A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6419875A priority Critical patent/JPS51140473A/en
Publication of JPS51140473A publication Critical patent/JPS51140473A/en
Publication of JPS557689B2 publication Critical patent/JPS557689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45508—Radial flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
JP6419875A 1975-05-30 1975-05-30 Device for forming film Granted JPS51140473A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6419875A JPS51140473A (en) 1975-05-30 1975-05-30 Device for forming film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6419875A JPS51140473A (en) 1975-05-30 1975-05-30 Device for forming film

Publications (2)

Publication Number Publication Date
JPS51140473A JPS51140473A (en) 1976-12-03
JPS557689B2 true JPS557689B2 (en) 1980-02-27

Family

ID=13251119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6419875A Granted JPS51140473A (en) 1975-05-30 1975-05-30 Device for forming film

Country Status (1)

Country Link
JP (1) JPS51140473A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59151434U (en) * 1983-03-28 1984-10-11 東芝機械株式会社 Vapor phase growth equipment nozzle
JPS60132320A (en) * 1983-12-21 1985-07-15 Matsushita Electric Ind Co Ltd Vapor-phase growing reaction pipe
JPS60118233U (en) * 1984-01-18 1985-08-09 ソニー株式会社 Vapor phase growth equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5046273A (en) * 1973-08-30 1975-04-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5046273A (en) * 1973-08-30 1975-04-24

Also Published As

Publication number Publication date
JPS51140473A (en) 1976-12-03

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