JPS5569416U - - Google Patents
Info
- Publication number
- JPS5569416U JPS5569416U JP15288078U JP15288078U JPS5569416U JP S5569416 U JPS5569416 U JP S5569416U JP 15288078 U JP15288078 U JP 15288078U JP 15288078 U JP15288078 U JP 15288078U JP S5569416 U JPS5569416 U JP S5569416U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15288078U JPS5569416U (en) | 1978-11-08 | 1978-11-08 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15288078U JPS5569416U (en) | 1978-11-08 | 1978-11-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5569416U true JPS5569416U (en) | 1980-05-13 |
Family
ID=29139518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15288078U Pending JPS5569416U (en) | 1978-11-08 | 1978-11-08 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5569416U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012212063A (en) * | 2011-03-31 | 2012-11-01 | Yoshino Kogyosho Co Ltd | Storage case for contact lens |
KR20210053905A (en) | 2018-09-11 | 2021-05-12 | 키오시아 가부시키가이샤 | Semiconductor device manufacturing method and etching gas |
-
1978
- 1978-11-08 JP JP15288078U patent/JPS5569416U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012212063A (en) * | 2011-03-31 | 2012-11-01 | Yoshino Kogyosho Co Ltd | Storage case for contact lens |
KR20210053905A (en) | 2018-09-11 | 2021-05-12 | 키오시아 가부시키가이샤 | Semiconductor device manufacturing method and etching gas |
KR20230097221A (en) | 2018-09-11 | 2023-06-30 | 키오시아 가부시키가이샤 | Method for manufacturing semiconductor device, and etching gas |