JPS556914B2 - - Google Patents
Info
- Publication number
- JPS556914B2 JPS556914B2 JP5848175A JP5848175A JPS556914B2 JP S556914 B2 JPS556914 B2 JP S556914B2 JP 5848175 A JP5848175 A JP 5848175A JP 5848175 A JP5848175 A JP 5848175A JP S556914 B2 JPS556914 B2 JP S556914B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/0402—Recording geometries or arrangements
- G03H1/0406—Image plane or focused image holograms, i.e. an image of the object or holobject is formed on, in or across the recording plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/024—Hologram nature or properties
- G03H1/0244—Surface relief holograms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H2001/0292—Replicating a master hologram without interference recording by masking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0276—Replicating a master hologram without interference recording
- G03H2001/0296—Formation of the master hologram
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2240/00—Hologram nature or properties
- G03H2240/20—Details of physical variations exhibited in the hologram
- G03H2240/40—Dynamic of the variations
- G03H2240/41—Binary
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/14—Photoresist
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2260/00—Recording materials or recording processes
- G03H2260/50—Reactivity or recording processes
- G03H2260/63—Indirect etching, e.g. lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H2270/00—Substrate bearing the hologram
- G03H2270/10—Composition
- G03H2270/11—Crystal or glass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Holo Graphy (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- ing And Chemical Polishing (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/472,436 US3945825A (en) | 1974-05-22 | 1974-05-22 | Method for producing width-modulated surface relief patterns |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5116060A JPS5116060A (US20040232935A1-20041125-M00001.png) | 1976-02-09 |
| JPS556914B2 true JPS556914B2 (US20040232935A1-20041125-M00001.png) | 1980-02-20 |
Family
ID=23875502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5848175A Expired JPS556914B2 (US20040232935A1-20041125-M00001.png) | 1974-05-22 | 1975-05-15 |
Country Status (12)
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6141079Y2 (US20040232935A1-20041125-M00001.png) * | 1979-06-15 | 1986-11-22 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1545048A (en) * | 1976-05-27 | 1979-05-02 | Rca Corp | Simplified diffractive colour filtering technique |
| GB1537703A (en) * | 1976-01-27 | 1979-01-04 | Rca Corp | Fabrication of rectangular relief profiles in photoresist |
| JPS5315152A (en) * | 1976-07-27 | 1978-02-10 | Canon Inc | Hologram |
| US4372649A (en) * | 1978-05-22 | 1983-02-08 | Minnesota Mining And Manufacturing Company | Extended area diffractive subtractive color filters |
| US4255514A (en) * | 1979-04-27 | 1981-03-10 | Rca Corporation | Method for fabricating a diffractive subtractive filter embossing master |
| US4315665A (en) * | 1979-09-07 | 1982-02-16 | Eidetic Images, Inc. | Composite optical element having controllable light transmission and reflection characteristics |
| US4514479A (en) * | 1980-07-01 | 1985-04-30 | The United States Of America As Represented By The Secretary Of The Navy | Method of making near infrared polarizers |
| US4440839A (en) * | 1981-03-18 | 1984-04-03 | United Technologies Corporation | Method of forming laser diffraction grating for beam sampling device |
| DE3123162A1 (de) * | 1981-06-11 | 1983-01-05 | Viktor Voskanovič Afian | Fokussiereinrichtung der lichtstrahlung und verfahren zu deren herstellung |
| JPS6025783B2 (ja) * | 1981-10-26 | 1985-06-20 | 株式会社リコー | 電子写真用転写紙 |
| US4496425A (en) * | 1984-01-30 | 1985-01-29 | At&T Technologies, Inc. | Technique for determining the end point of an etching process |
| JPS6151869A (ja) * | 1984-08-20 | 1986-03-14 | Mitsubishi Electric Corp | 半導体記憶装置およびその製造方法 |
| FR2587504B1 (fr) * | 1985-09-19 | 1989-11-03 | Mutzel Francis | Montre-hologramme |
| US4933205A (en) * | 1987-10-09 | 1990-06-12 | Duley Walter W | Laser etching of foam substrate |
| US4769257A (en) * | 1987-10-09 | 1988-09-06 | Duley Walter W | Laser etching of foam substrate |
| US4972061A (en) * | 1987-12-17 | 1990-11-20 | Duley Walter W | Laser surface treatment |
| US4828356A (en) * | 1987-12-22 | 1989-05-09 | Hughes Aircraft Company | Method for fabrication of low efficiency diffraction gratings and product obtained thereby |
| US5059499A (en) * | 1988-06-03 | 1991-10-22 | Michael Teitel | Master hologram and micropattern replication method |
| DE4024748C1 (en) * | 1990-08-03 | 1992-03-12 | Carlo Dr. 8031 Eichenau De Schmelzer | Hologram die prodn. for interference pattern - by exposing holographic recording material to laser beam, developing enzyme treating forming plastic impression and electroplating |
| US6709790B1 (en) * | 1992-08-26 | 2004-03-23 | Goodrich Corporation | Method and apparatus for generating periodic structures in substrates by synthetic wavelength holograph exposure |
| DE10025694C2 (de) | 2000-05-24 | 2003-06-05 | Zeiss Carl | Verwendung eines Beugungsgitters |
| US7867695B2 (en) * | 2003-09-11 | 2011-01-11 | Bright View Technologies Corporation | Methods for mastering microstructures through a substrate using negative photoresist |
| US7192692B2 (en) * | 2003-09-11 | 2007-03-20 | Bright View Technologies, Inc. | Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers |
| US7190387B2 (en) * | 2003-09-11 | 2007-03-13 | Bright View Technologies, Inc. | Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam |
| CN111769370A (zh) * | 2019-04-02 | 2020-10-13 | 富泰华工业（深圳）有限公司 | 全息天线及其制作方法 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3733258A (en) * | 1971-02-03 | 1973-05-15 | Rca Corp | Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1080364A (en) * | 1963-03-28 | 1967-08-23 | Nat Res Dev | Preparation of diffraction gratings |
| US3580657A (en) * | 1968-05-14 | 1971-05-25 | Xerox Corp | Blazed surface hologram |
| US3623798A (en) * | 1970-01-21 | 1971-11-30 | Xerox Corp | Blazed hologram fabrication |
| US3743507A (en) * | 1970-10-23 | 1973-07-03 | Rca Corp | Recording of a continuous tone focused image on a diffraction grating |
| US3669673A (en) * | 1970-10-23 | 1972-06-13 | Rca Corp | Recording of a continuous tone focused image on a diffraction grating |
-
1974
- 1974-05-22 US US05/472,436 patent/US3945825A/en not_active Expired - Lifetime
-
1975
- 1975-04-17 IT IT22461/75A patent/IT1037346B/it active
- 1975-04-22 CA CA225,137A patent/CA1034411A/en not_active Expired
- 1975-05-02 GB GB18554/75A patent/GB1508178A/en not_active Expired
- 1975-05-15 JP JP5848175A patent/JPS556914B2/ja not_active Expired
- 1975-05-16 AU AU81247/75A patent/AU496732B2/en not_active Expired
- 1975-05-20 BE BE156506A patent/BE829258A/xx unknown
- 1975-05-21 DE DE19752522547 patent/DE2522547A1/de not_active Withdrawn
- 1975-05-21 NL NL7505957A patent/NL7505957A/xx not_active Application Discontinuation
- 1975-05-21 SE SE7505783A patent/SE7505783L/xx unknown
- 1975-05-22 CH CH655575A patent/CH600383A5/xx not_active IP Right Cessation
- 1975-05-22 FR FR7515999A patent/FR2272405A1/fr not_active Withdrawn
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3733258A (en) * | 1971-02-03 | 1973-05-15 | Rca Corp | Sputter-etching technique for recording holograms or other fine-detail relief patterns in hard durable materials |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6141079Y2 (US20040232935A1-20041125-M00001.png) * | 1979-06-15 | 1986-11-22 |
Also Published As
| Publication number | Publication date |
|---|---|
| IT1037346B (it) | 1979-11-10 |
| DE2522547A1 (de) | 1975-12-04 |
| AU8124775A (en) | 1976-11-18 |
| FR2272405A1 (US20040232935A1-20041125-M00001.png) | 1975-12-19 |
| AU496732B2 (en) | 1978-10-26 |
| BE829258A (fr) | 1975-09-15 |
| JPS5116060A (US20040232935A1-20041125-M00001.png) | 1976-02-09 |
| CH600383A5 (US20040232935A1-20041125-M00001.png) | 1978-06-15 |
| CA1034411A (en) | 1978-07-11 |
| SE7505783L (sv) | 1975-11-24 |
| NL7505957A (nl) | 1975-11-25 |
| US3945825A (en) | 1976-03-23 |
| GB1508178A (en) | 1978-04-19 |
| DE2522547B2 (US20040232935A1-20041125-M00001.png) | 1980-01-17 |
