JPS556468A - Electroplating method of metal wire - Google Patents

Electroplating method of metal wire

Info

Publication number
JPS556468A
JPS556468A JP7837178A JP7837178A JPS556468A JP S556468 A JPS556468 A JP S556468A JP 7837178 A JP7837178 A JP 7837178A JP 7837178 A JP7837178 A JP 7837178A JP S556468 A JPS556468 A JP S556468A
Authority
JP
Japan
Prior art keywords
lines
plating
current
wire
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7837178A
Other languages
Japanese (ja)
Inventor
Akira Shimada
Tatsuji Kasashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainichi Nippon Cables Ltd
Original Assignee
Dainichi Nippon Cables Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainichi Nippon Cables Ltd filed Critical Dainichi Nippon Cables Ltd
Priority to JP7837178A priority Critical patent/JPS556468A/en
Publication of JPS556468A publication Critical patent/JPS556468A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE: To make possible the use of low capacity small rectifiers by providing a wire accumulating part for the wire to be plated between plating lines, series-connecting all the plating lines to a DC power source and applying voltages to all the plating lines at nearly equal potential differences.
CONSTITUTION: Loads of all lines A1, A2 ... are nearly constant and the voltage of a DC power source D is dividedly applied at a fixed potential difference E to each line. Hence, the potential difference between the wires to be plated is E and the current flowing in the wire to be plated of the wire accumulating part B is E/R because the electric resistance of the accumulated wire to be plated is R. If this electric resistance R is considerably increased, the current E/R becomes substantially zero. If the number of electrolytic cells per line is made n and the plating currrent required per unit of electrolytic cell I, then the plating current required for 1 line is nI and since all the lines are series-connected, the plating current to be supplied to all the lines is nI. The current capacity of the rectifier for obtaining DC may be made to the low capacity corresponding to the current per line.
COPYRIGHT: (C)1980,JPO&Japio
JP7837178A 1978-06-27 1978-06-27 Electroplating method of metal wire Pending JPS556468A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7837178A JPS556468A (en) 1978-06-27 1978-06-27 Electroplating method of metal wire

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7837178A JPS556468A (en) 1978-06-27 1978-06-27 Electroplating method of metal wire

Publications (1)

Publication Number Publication Date
JPS556468A true JPS556468A (en) 1980-01-17

Family

ID=13660142

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7837178A Pending JPS556468A (en) 1978-06-27 1978-06-27 Electroplating method of metal wire

Country Status (1)

Country Link
JP (1) JPS556468A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04108940U (en) * 1991-03-05 1992-09-21 三菱マテリアル株式会社 Work sending device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04108940U (en) * 1991-03-05 1992-09-21 三菱マテリアル株式会社 Work sending device

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