JPS5544798A - Method of cleaning silicon surface - Google Patents
Method of cleaning silicon surfaceInfo
- Publication number
- JPS5544798A JPS5544798A JP12018979A JP12018979A JPS5544798A JP S5544798 A JPS5544798 A JP S5544798A JP 12018979 A JP12018979 A JP 12018979A JP 12018979 A JP12018979 A JP 12018979A JP S5544798 A JPS5544798 A JP S5544798A
- Authority
- JP
- Japan
- Prior art keywords
- silicon surface
- cleaning silicon
- cleaning
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US94576178A | 1978-09-25 | 1978-09-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5544798A true JPS5544798A (en) | 1980-03-29 |
Family
ID=25483524
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12018979A Pending JPS5544798A (en) | 1978-09-25 | 1979-09-20 | Method of cleaning silicon surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5544798A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02177327A (en) * | 1988-12-27 | 1990-07-10 | Mitsubishi Electric Corp | Cleaning of semiconductor wafer, etching thereof and semiconductor wafer treatment device |
CN1082246C (en) * | 1995-03-27 | 2002-04-03 | 索尼公司 | Method of cleaning substrate |
-
1979
- 1979-09-20 JP JP12018979A patent/JPS5544798A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02177327A (en) * | 1988-12-27 | 1990-07-10 | Mitsubishi Electric Corp | Cleaning of semiconductor wafer, etching thereof and semiconductor wafer treatment device |
CN1082246C (en) * | 1995-03-27 | 2002-04-03 | 索尼公司 | Method of cleaning substrate |
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