JPS5544798A - Method of cleaning silicon surface - Google Patents

Method of cleaning silicon surface

Info

Publication number
JPS5544798A
JPS5544798A JP12018979A JP12018979A JPS5544798A JP S5544798 A JPS5544798 A JP S5544798A JP 12018979 A JP12018979 A JP 12018979A JP 12018979 A JP12018979 A JP 12018979A JP S5544798 A JPS5544798 A JP S5544798A
Authority
JP
Japan
Prior art keywords
silicon surface
cleaning silicon
cleaning
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12018979A
Other languages
Japanese (ja)
Inventor
Dei Beiyaa Kurausu
Eichi Kasutoru Robaato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5544798A publication Critical patent/JPS5544798A/en
Pending legal-status Critical Current

Links

JP12018979A 1978-09-25 1979-09-20 Method of cleaning silicon surface Pending JPS5544798A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US94576178A 1978-09-25 1978-09-25

Publications (1)

Publication Number Publication Date
JPS5544798A true JPS5544798A (en) 1980-03-29

Family

ID=25483524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12018979A Pending JPS5544798A (en) 1978-09-25 1979-09-20 Method of cleaning silicon surface

Country Status (1)

Country Link
JP (1) JPS5544798A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02177327A (en) * 1988-12-27 1990-07-10 Mitsubishi Electric Corp Cleaning of semiconductor wafer, etching thereof and semiconductor wafer treatment device
CN1082246C (en) * 1995-03-27 2002-04-03 索尼公司 Method of cleaning substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02177327A (en) * 1988-12-27 1990-07-10 Mitsubishi Electric Corp Cleaning of semiconductor wafer, etching thereof and semiconductor wafer treatment device
CN1082246C (en) * 1995-03-27 2002-04-03 索尼公司 Method of cleaning substrate

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