JPS5543900A - Apparatus for manufacturing semiconductor device - Google Patents

Apparatus for manufacturing semiconductor device

Info

Publication number
JPS5543900A
JPS5543900A JP12190679A JP12190679A JPS5543900A JP S5543900 A JPS5543900 A JP S5543900A JP 12190679 A JP12190679 A JP 12190679A JP 12190679 A JP12190679 A JP 12190679A JP S5543900 A JPS5543900 A JP S5543900A
Authority
JP
Japan
Prior art keywords
semiconductor device
manufacturing semiconductor
manufacturing
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12190679A
Other languages
English (en)
Inventor
Chitsushiyaa Peetaa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5543900A publication Critical patent/JPS5543900A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0278—Röntgenlithographic or X-ray lithographic processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12190679A 1978-09-21 1979-09-21 Apparatus for manufacturing semiconductor device Pending JPS5543900A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2841124A DE2841124C2 (de) 1978-09-21 1978-09-21 Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie

Publications (1)

Publication Number Publication Date
JPS5543900A true JPS5543900A (en) 1980-03-27

Family

ID=6050060

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12190679A Pending JPS5543900A (en) 1978-09-21 1979-09-21 Apparatus for manufacturing semiconductor device

Country Status (3)

Country Link
US (1) US4238685A (ja)
JP (1) JPS5543900A (ja)
DE (1) DE2841124C2 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56108231A (en) * 1980-02-01 1981-08-27 Ushio Inc Annealing method of semiconductor wafer
GB2155201B (en) * 1984-02-24 1988-07-13 Canon Kk An x-ray exposure apparatus
EP0233862A1 (en) * 1985-08-27 1987-09-02 LOCKHEED MISSILES & SPACE COMPANY, INC. Gate alignment procedure in fabricating semiconductor devices
JPH03504286A (ja) * 1988-05-18 1991-09-19 シーメンス、アクチエンゲゼルシヤフト Ｘ線リソグラフイの投影スケール変更方法
US5650629A (en) * 1994-06-28 1997-07-22 The United States Of America As Represented By The Secretary Of The Air Force Field-symmetric beam detector for semiconductors
US5643428A (en) * 1995-02-01 1997-07-01 Advanced Micro Devices, Inc. Multiple tier collimator system for enhanced step coverage and uniformity
US5691446A (en) * 1995-08-25 1997-11-25 Dove; Jeffrey S. Methods for reducing allergenicity of natural rubber latex articles and articles so produced
TW200407995A (en) * 2002-11-08 2004-05-16 Nanya Technology Corp Mark and method for multiple alignment

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
US3984680A (en) * 1975-10-14 1976-10-05 Massachusetts Institute Of Technology Soft X-ray mask alignment system
DE2547079C3 (de) * 1975-10-17 1979-12-06 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Korpuskularbestrahlung eines Präparats
DE2739502C3 (de) * 1977-09-02 1980-07-03 Ibm Deutschland Gmbh, 7000 Stuttgart Verfahren zur Belichtung durch Korpuskularstrahlen-Schattenwurf und Vorrichtung zur Durchführung des Verfahrens

Also Published As

Publication number Publication date
DE2841124C2 (de) 1984-09-13
US4238685A (en) 1980-12-09
DE2841124A1 (de) 1980-04-03

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