JPS5543900A - Apparatus for manufacturing semiconductor device - Google Patents
Apparatus for manufacturing semiconductor deviceInfo
- Publication number
- JPS5543900A JPS5543900A JP12190679A JP12190679A JPS5543900A JP S5543900 A JPS5543900 A JP S5543900A JP 12190679 A JP12190679 A JP 12190679A JP 12190679 A JP12190679 A JP 12190679A JP S5543900 A JPS5543900 A JP S5543900A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- manufacturing semiconductor
- manufacturing
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0278—Röntgenlithographic or X-ray lithographic processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2841124A DE2841124C2 (de) | 1978-09-21 | 1978-09-21 | Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5543900A true JPS5543900A (en) | 1980-03-27 |
Family
ID=6050060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12190679A Pending JPS5543900A (en) | 1978-09-21 | 1979-09-21 | Apparatus for manufacturing semiconductor device |
Country Status (3)
Country | Link |
---|---|
US (1) | US4238685A (ja) |
JP (1) | JPS5543900A (ja) |
DE (1) | DE2841124C2 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56108231A (en) * | 1980-02-01 | 1981-08-27 | Ushio Inc | Annealing method of semiconductor wafer |
GB2155201B (en) * | 1984-02-24 | 1988-07-13 | Canon Kk | An x-ray exposure apparatus |
EP0233862A1 (en) * | 1985-08-27 | 1987-09-02 | LOCKHEED MISSILES & SPACE COMPANY, INC. | Gate alignment procedure in fabricating semiconductor devices |
JPH03504286A (ja) * | 1988-05-18 | 1991-09-19 | シーメンス、アクチエンゲゼルシヤフト | X線リソグラフイの投影スケール変更方法 |
US5650629A (en) * | 1994-06-28 | 1997-07-22 | The United States Of America As Represented By The Secretary Of The Air Force | Field-symmetric beam detector for semiconductors |
US5643428A (en) * | 1995-02-01 | 1997-07-01 | Advanced Micro Devices, Inc. | Multiple tier collimator system for enhanced step coverage and uniformity |
US5691446A (en) * | 1995-08-25 | 1997-11-25 | Dove; Jeffrey S. | Methods for reducing allergenicity of natural rubber latex articles and articles so produced |
TW200407995A (en) * | 2002-11-08 | 2004-05-16 | Nanya Technology Corp | Mark and method for multiple alignment |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
US3984680A (en) * | 1975-10-14 | 1976-10-05 | Massachusetts Institute Of Technology | Soft X-ray mask alignment system |
DE2547079C3 (de) * | 1975-10-17 | 1979-12-06 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Korpuskularbestrahlung eines Präparats |
DE2739502C3 (de) * | 1977-09-02 | 1980-07-03 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zur Belichtung durch Korpuskularstrahlen-Schattenwurf und Vorrichtung zur Durchführung des Verfahrens |
-
1978
- 1978-09-21 DE DE2841124A patent/DE2841124C2/de not_active Expired
-
1979
- 1979-08-15 US US06/066,849 patent/US4238685A/en not_active Expired - Lifetime
- 1979-09-21 JP JP12190679A patent/JPS5543900A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2841124C2 (de) | 1984-09-13 |
US4238685A (en) | 1980-12-09 |
DE2841124A1 (de) | 1980-04-03 |
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