JPS5539164A - Electron flow device - Google Patents

Electron flow device

Info

Publication number
JPS5539164A
JPS5539164A JP11279178A JP11279178A JPS5539164A JP S5539164 A JPS5539164 A JP S5539164A JP 11279178 A JP11279178 A JP 11279178A JP 11279178 A JP11279178 A JP 11279178A JP S5539164 A JPS5539164 A JP S5539164A
Authority
JP
Japan
Prior art keywords
high voltage
electron flow
power
voltage sources
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11279178A
Other languages
Japanese (ja)
Inventor
Hideki Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP11279178A priority Critical patent/JPS5539164A/en
Publication of JPS5539164A publication Critical patent/JPS5539164A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE: To enable sequential rising of power by employing small to middle capacity standard DC high voltage source and combining some of them.
CONSTITUTION: Negative high potential and electronic emitter heating power are supplied from high voltage sources 21W23 containing DC high voltage sources 5, 5', 5" through high voltage cables 14, 14', 14" to electronic emitter elements 1, 1', 1". Only one waynelt 2 is provided and electron flow control potential is supplied from DC power source 7 in the high voltage source 21. High voltage sources 21W23 are similarly constructed and combined large power can be provided to the combined electron flow 8.
COPYRIGHT: (C)1980,JPO&Japio
JP11279178A 1978-09-12 1978-09-12 Electron flow device Pending JPS5539164A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11279178A JPS5539164A (en) 1978-09-12 1978-09-12 Electron flow device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11279178A JPS5539164A (en) 1978-09-12 1978-09-12 Electron flow device

Publications (1)

Publication Number Publication Date
JPS5539164A true JPS5539164A (en) 1980-03-18

Family

ID=14595597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11279178A Pending JPS5539164A (en) 1978-09-12 1978-09-12 Electron flow device

Country Status (1)

Country Link
JP (1) JPS5539164A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136335A (en) * 1981-01-12 1982-08-23 Energy Sciences Inc Method and device for treating article with fine focused electron beam

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5214584A (en) * 1975-07-25 1977-02-03 Asahi Glass Co Ltd Electrodialysis method of a base-containing solution

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5214584A (en) * 1975-07-25 1977-02-03 Asahi Glass Co Ltd Electrodialysis method of a base-containing solution

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57136335A (en) * 1981-01-12 1982-08-23 Energy Sciences Inc Method and device for treating article with fine focused electron beam

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