JPS5539164A - Electron flow device - Google Patents
Electron flow deviceInfo
- Publication number
- JPS5539164A JPS5539164A JP11279178A JP11279178A JPS5539164A JP S5539164 A JPS5539164 A JP S5539164A JP 11279178 A JP11279178 A JP 11279178A JP 11279178 A JP11279178 A JP 11279178A JP S5539164 A JPS5539164 A JP S5539164A
- Authority
- JP
- Japan
- Prior art keywords
- high voltage
- electron flow
- power
- voltage sources
- supplied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE: To enable sequential rising of power by employing small to middle capacity standard DC high voltage source and combining some of them.
CONSTITUTION: Negative high potential and electronic emitter heating power are supplied from high voltage sources 21W23 containing DC high voltage sources 5, 5', 5" through high voltage cables 14, 14', 14" to electronic emitter elements 1, 1', 1". Only one waynelt 2 is provided and electron flow control potential is supplied from DC power source 7 in the high voltage source 21. High voltage sources 21W23 are similarly constructed and combined large power can be provided to the combined electron flow 8.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11279178A JPS5539164A (en) | 1978-09-12 | 1978-09-12 | Electron flow device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11279178A JPS5539164A (en) | 1978-09-12 | 1978-09-12 | Electron flow device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5539164A true JPS5539164A (en) | 1980-03-18 |
Family
ID=14595597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11279178A Pending JPS5539164A (en) | 1978-09-12 | 1978-09-12 | Electron flow device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5539164A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57136335A (en) * | 1981-01-12 | 1982-08-23 | Energy Sciences Inc | Method and device for treating article with fine focused electron beam |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214584A (en) * | 1975-07-25 | 1977-02-03 | Asahi Glass Co Ltd | Electrodialysis method of a base-containing solution |
-
1978
- 1978-09-12 JP JP11279178A patent/JPS5539164A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5214584A (en) * | 1975-07-25 | 1977-02-03 | Asahi Glass Co Ltd | Electrodialysis method of a base-containing solution |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57136335A (en) * | 1981-01-12 | 1982-08-23 | Energy Sciences Inc | Method and device for treating article with fine focused electron beam |
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