JPS5536769A - Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device - Google Patents

Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device

Info

Publication number
JPS5536769A
JPS5536769A JP11000578A JP11000578A JPS5536769A JP S5536769 A JPS5536769 A JP S5536769A JP 11000578 A JP11000578 A JP 11000578A JP 11000578 A JP11000578 A JP 11000578A JP S5536769 A JPS5536769 A JP S5536769A
Authority
JP
Japan
Prior art keywords
reaction pipe
residual liquid
wipe
heating
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11000578A
Other languages
English (en)
Japanese (ja)
Other versions
JPS615620B2 (https=
Inventor
Koichi Wakatake
Kimimichi Tominaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Tectron Instruments Corp
Original Assignee
Japan Tectron Instruments Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Tectron Instruments Corp filed Critical Japan Tectron Instruments Corp
Priority to JP11000578A priority Critical patent/JPS5536769A/ja
Publication of JPS5536769A publication Critical patent/JPS5536769A/ja
Publication of JPS615620B2 publication Critical patent/JPS615620B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Solid Materials (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
JP11000578A 1978-09-07 1978-09-07 Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device Granted JPS5536769A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11000578A JPS5536769A (en) 1978-09-07 1978-09-07 Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11000578A JPS5536769A (en) 1978-09-07 1978-09-07 Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device

Publications (2)

Publication Number Publication Date
JPS5536769A true JPS5536769A (en) 1980-03-14
JPS615620B2 JPS615620B2 (https=) 1986-02-20

Family

ID=14524679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11000578A Granted JPS5536769A (en) 1978-09-07 1978-09-07 Wipe-out device of residual liquid of reaction pipe bottom in automatic chemical analysis device

Country Status (1)

Country Link
JP (1) JPS5536769A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5761559U (https=) * 1980-09-19 1982-04-12
JPS57113368A (en) * 1981-01-06 1982-07-14 Toshiba Corp Washing and drying device in automatic chemical analyzer
JPS5845566A (ja) * 1981-09-11 1983-03-16 Toshiba Corp 生化学自動分析装置における洗浄装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04134511U (ja) * 1991-05-28 1992-12-15 酒井重工業株式会社 転圧機械の噴霧装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5761559U (https=) * 1980-09-19 1982-04-12
JPS57113368A (en) * 1981-01-06 1982-07-14 Toshiba Corp Washing and drying device in automatic chemical analyzer
JPS5845566A (ja) * 1981-09-11 1983-03-16 Toshiba Corp 生化学自動分析装置における洗浄装置

Also Published As

Publication number Publication date
JPS615620B2 (https=) 1986-02-20

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